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Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces

Cathren Gowenlock Orcid Logo, Virginia Gomez Orcid Logo, James McGettrick Orcid Logo, Enrico Andreoli Orcid Logo, Andrew Barron Orcid Logo

Journal of Coatings Technology and Research, Volume: 14, Issue: 1, Pages: 195 - 205

Swansea University Authors: Cathren Gowenlock Orcid Logo, Virginia Gomez Orcid Logo, James McGettrick Orcid Logo, Enrico Andreoli Orcid Logo, Andrew Barron Orcid Logo

Abstract

Isonicotinate self-assembled monolayers (SAM) were prepared on alumina surfaces (A) using isonicotinic acid (iNA). These functionalized layers (iNA-A) were used for the seeded growth of copper films (Cu-iNA-A) by hydrazine hydrate-initiated electroless deposition. The films were characterized by sca...

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Published in: Journal of Coatings Technology and Research
ISSN: 1547-0091 1935-3804
Published: 2017
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URI: https://cronfa.swan.ac.uk/Record/cronfa30991
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spelling 2017-11-01T15:08:18.1525944 v2 30991 2016-11-08 Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces 3e999073c98799427c833bb5d331ef51 0000-0001-5774-5263 Cathren Gowenlock Cathren Gowenlock true false 2b0a7a13d79d306b3e0be7d30df54844 0000-0002-7846-9066 Virginia Gomez Virginia Gomez true false bdbacc591e2de05180e0fd3cc13fa480 0000-0002-7719-2958 James McGettrick James McGettrick true false cbd843daab780bb55698a3daccd74df8 0000-0002-1207-2314 Enrico Andreoli Enrico Andreoli true false 92e452f20936d688d36f91c78574241d 0000-0002-2018-8288 Andrew Barron Andrew Barron true false 2016-11-08 EEN Isonicotinate self-assembled monolayers (SAM) were prepared on alumina surfaces (A) using isonicotinic acid (iNA). These functionalized layers (iNA-A) were used for the seeded growth of copper films (Cu-iNA-A) by hydrazine hydrate-initiated electroless deposition. The films were characterized by scanning electron microscopy (SEM), electron-dispersive X-ray spectroscopy, atomic force microscopy, X-ray photoelectron spectroscopy, X-ray diffraction, and advancing contact angle measurements. The films are Cu0 but with surface oxidation, and show a faceted morphology, which is more textured (Rq = 460 ± 90 nm) compared to the SAM (Rq = 2.8 ± 0.5 nm). In contrast, growth of copper films by SnCl2/PdCl2 catalyzed electroless deposition, using formaldehyde (CH2O) as the reducing agent, shows a nodular morphology on top of a relatively smooth surface. No copper films are observed in the absence of the isonicotinate SAM. The binding of Cu2+ to the iNA is proposed to facilitate reduction to Cu0 and create the seed for subsequent growth. The films show good adhesion to the functionalized surface. Journal Article Journal of Coatings Technology and Research 14 1 195 205 1547-0091 1935-3804 31 1 2017 2017-01-31 10.1007/s11998-016-9842-0 COLLEGE NANME Engineering COLLEGE CODE EEN Swansea University 2017-11-01T15:08:18.1525944 2016-11-08T12:56:05.3189927 Faculty of Science and Engineering School of Engineering and Applied Sciences - Uncategorised Cathren Gowenlock 0000-0001-5774-5263 1 Virginia Gomez 0000-0002-7846-9066 2 James McGettrick 0000-0002-7719-2958 3 Enrico Andreoli 0000-0002-1207-2314 4 Andrew Barron 0000-0002-2018-8288 5 0030991-08112016132447.pdf gowenlock2016.pdf 2016-11-08T13:24:47.8730000 Output 2023093 application/pdf Version of Record true 2016-11-08T00:00:00.0000000 false
title Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces
spellingShingle Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces
Cathren Gowenlock
Virginia Gomez
James McGettrick
Enrico Andreoli
Andrew Barron
title_short Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces
title_full Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces
title_fullStr Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces
title_full_unstemmed Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces
title_sort Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces
author_id_str_mv 3e999073c98799427c833bb5d331ef51
2b0a7a13d79d306b3e0be7d30df54844
bdbacc591e2de05180e0fd3cc13fa480
cbd843daab780bb55698a3daccd74df8
92e452f20936d688d36f91c78574241d
author_id_fullname_str_mv 3e999073c98799427c833bb5d331ef51_***_Cathren Gowenlock
2b0a7a13d79d306b3e0be7d30df54844_***_Virginia Gomez
bdbacc591e2de05180e0fd3cc13fa480_***_James McGettrick
cbd843daab780bb55698a3daccd74df8_***_Enrico Andreoli
92e452f20936d688d36f91c78574241d_***_Andrew Barron
author Cathren Gowenlock
Virginia Gomez
James McGettrick
Enrico Andreoli
Andrew Barron
author2 Cathren Gowenlock
Virginia Gomez
James McGettrick
Enrico Andreoli
Andrew Barron
format Journal article
container_title Journal of Coatings Technology and Research
container_volume 14
container_issue 1
container_start_page 195
publishDate 2017
institution Swansea University
issn 1547-0091
1935-3804
doi_str_mv 10.1007/s11998-016-9842-0
college_str Faculty of Science and Engineering
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hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Uncategorised{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Uncategorised
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description Isonicotinate self-assembled monolayers (SAM) were prepared on alumina surfaces (A) using isonicotinic acid (iNA). These functionalized layers (iNA-A) were used for the seeded growth of copper films (Cu-iNA-A) by hydrazine hydrate-initiated electroless deposition. The films were characterized by scanning electron microscopy (SEM), electron-dispersive X-ray spectroscopy, atomic force microscopy, X-ray photoelectron spectroscopy, X-ray diffraction, and advancing contact angle measurements. The films are Cu0 but with surface oxidation, and show a faceted morphology, which is more textured (Rq = 460 ± 90 nm) compared to the SAM (Rq = 2.8 ± 0.5 nm). In contrast, growth of copper films by SnCl2/PdCl2 catalyzed electroless deposition, using formaldehyde (CH2O) as the reducing agent, shows a nodular morphology on top of a relatively smooth surface. No copper films are observed in the absence of the isonicotinate SAM. The binding of Cu2+ to the iNA is proposed to facilitate reduction to Cu0 and create the seed for subsequent growth. The films show good adhesion to the functionalized surface.
published_date 2017-01-31T03:37:48Z
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