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Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**

Luz Romero, Clara Piccirillo, Paula M. L. Castro, Christopher Bowman, Michael Warwick Orcid Logo, Russell Binions

Chemical Vapor Deposition, Volume: 21, Issue: 1-2-3, Pages: 63 - 70

Swansea University Author: Michael Warwick Orcid Logo

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DOI (Published version): 10.1002/cvde.201407145

Abstract

Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA)CVD reaction of titanium isopropoxide in toluene at 450 °C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-r...

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Published in: Chemical Vapor Deposition
ISSN: 0948-1907
Published: 2015
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URI: https://cronfa.swan.ac.uk/Record/cronfa32766
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spelling 2017-04-03T13:24:00.3370695 v2 32766 2017-03-29 Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties** 9fdabb7283ffccc5898cc543305475cf 0000-0002-9028-1250 Michael Warwick Michael Warwick true false 2017-03-29 FGSEN Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA)CVD reaction of titanium isopropoxide in toluene at 450 °C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy (RS), and UV-vis spectroscopy. The photoactivity and antibacterial activity of the films are also assessed. The characterization analysis reveals that the use of an electric field affects the film microstructure, its preferential orientation, and the functional properties. XRD of the anatase films reveals that the application of electric fields causes a change in the preferential orientation of the films from (101) to (004) or (211) planes, depending on the strength of the applied field during the deposition. Journal Article Chemical Vapor Deposition 21 1-2-3 63 70 0948-1907 31 12 2015 2015-12-31 10.1002/cvde.201407145 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000350977900008&amp;KeyUID=WOS:000350977900008 COLLEGE NANME Science and Engineering - Faculty COLLEGE CODE FGSEN Swansea University 2017-04-03T13:24:00.3370695 2017-03-29T09:52:57.2347130 Faculty of Science and Engineering School of Engineering and Applied Sciences - Uncategorised Luz Romero 1 Clara Piccirillo 2 Paula M. L. Castro 3 Christopher Bowman 4 Michael Warwick 0000-0002-9028-1250 5 Russell Binions 6
title Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**
spellingShingle Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**
Michael Warwick
title_short Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**
title_full Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**
title_fullStr Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**
title_full_unstemmed Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**
title_sort Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**
author_id_str_mv 9fdabb7283ffccc5898cc543305475cf
author_id_fullname_str_mv 9fdabb7283ffccc5898cc543305475cf_***_Michael Warwick
author Michael Warwick
author2 Luz Romero
Clara Piccirillo
Paula M. L. Castro
Christopher Bowman
Michael Warwick
Russell Binions
format Journal article
container_title Chemical Vapor Deposition
container_volume 21
container_issue 1-2-3
container_start_page 63
publishDate 2015
institution Swansea University
issn 0948-1907
doi_str_mv 10.1002/cvde.201407145
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Uncategorised{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Uncategorised
url http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000350977900008&amp;KeyUID=WOS:000350977900008
document_store_str 0
active_str 0
description Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA)CVD reaction of titanium isopropoxide in toluene at 450 °C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy (RS), and UV-vis spectroscopy. The photoactivity and antibacterial activity of the films are also assessed. The characterization analysis reveals that the use of an electric field affects the film microstructure, its preferential orientation, and the functional properties. XRD of the anatase films reveals that the application of electric fields causes a change in the preferential orientation of the films from (101) to (004) or (211) planes, depending on the strength of the applied field during the deposition.
published_date 2015-12-31T03:40:16Z
_version_ 1763751825416126464
score 11.036334

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