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Dip-pen patterning of poly(9,9-dioctylfluorene) chain-conformation-based nano-photonic elements / Aleksandr Perevedentsev; Yannick Sonnefraud; Colin R. Belton; Sanjiv Sharma; Anthony E. G. Cass; Stefan A. Maier; Ji-Seon Kim; Paul N. Stavrinou; Donal D. C. Bradley

Nature Communications, Volume: 6, Issue: 1, Start page: 5977

Swansea University Author: Sanjiv, Sharma

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DOI (Published version): 10.1038/ncomms6977

Abstract

Metamaterials are a promising new class of materials, in which sub-wavelength physical structures, rather than variations in chemical composition, can be used to modify the nature of their interaction with electromagnetic radiation. Here we show that a metamaterials approach, using a discrete physic...

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Published in: Nature Communications
ISSN: 2041-1723
Published: Springer Science and Business Media LLC 2015
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa36439
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Abstract: Metamaterials are a promising new class of materials, in which sub-wavelength physical structures, rather than variations in chemical composition, can be used to modify the nature of their interaction with electromagnetic radiation. Here we show that a metamaterials approach, using a discrete physical geometry (conformation) of the segments of a polymer chain as the vector for a substantial refractive index change, can be used to enable visible wavelength, conjugated polymer photonic elements. In particular, we demonstrate that a novel form of dip-pen nanolithography provides an effective means to pattern the so-called β-phase conformation in poly(9,9-dioctylfluorene) thin films. This can be done on length scales ≤500 nm, as required to fabricate a variety of such elements, two of which are theoretically modelled using complex photonic dispersion calculations.
Keywords: Dip pen nano (DPN) lithography, Metamaterials, Materials Science, Optical Physics, Nanotechnology
College: College of Engineering
Issue: 1
Start Page: 5977