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Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition

M Chhowalla, KBK Teo, C Ducati, NL Rupesinghe, GAJ Amaratunga, AC Ferrari, D Roy, J Robertson, WI Milne, Deb Roy Orcid Logo

Journal of Applied Physics, Volume: 90, Issue: 10, Pages: 5308 - 5317

Swansea University Author: Deb Roy Orcid Logo

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DOI (Published version): 10.1063/1.1410322

Published in: Journal of Applied Physics
ISSN: 0021-8979 1089-7550
Published: 2001
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URI: https://cronfa.swan.ac.uk/Record/cronfa37251
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College: Faculty of Science and Engineering
Issue: 10
Start Page: 5308
End Page: 5317