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Preparation and photoelectric properties of SnOx films with tunable optical bandgap / Vincent, Teng

Chemical Physics Letters, Volume: 739, Start page: 137039

Swansea University Author: Vincent, Teng

  • Accepted Manuscript under embargo until: 13th December 2020

Abstract

SnOx thin films with tunable optical bandgap were prepared using RF magnetron sputtering. The bandgap was adjustable between 2.16 and 3.96 eV depending on oxygen partial pressure during deposition and heat treatment. The structure and properties of the SnOx films were studied. The optical absorption...

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Published in: Chemical Physics Letters
ISSN: 0009-2614
Published: Elsevier BV 2020
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa53123
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Abstract: SnOx thin films with tunable optical bandgap were prepared using RF magnetron sputtering. The bandgap was adjustable between 2.16 and 3.96 eV depending on oxygen partial pressure during deposition and heat treatment. The structure and properties of the SnOx films were studied. The optical absorption of the SnOx films covered multiple ultraviolet bands, such as UVA, UVB and UVC. A photodetector based on the annealed SnOx film exhibited a detectivity of 1 × 1011 Jones (under 365 nm UV light) at room temperature, which demonstrates the important potential application of SnOx films for UV detection.
Keywords: SnOx, Oxygen partial pressure, Tunable optical band gap, Ultraviolet detection
Start Page: 137039