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Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells

Heather M. Yates, John L. Hodgkinson, Simone Meroni Orcid Logo, David Richards, Trystan Watson Orcid Logo

Surface and Coatings Technology, Volume: 385, Start page: 125423

Swansea University Authors: Simone Meroni Orcid Logo, Trystan Watson Orcid Logo

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Abstract

Thin films of polycrystalline NiO were deposited by Flame Assisted Chemical Vapour Deposition, which is an ideal process for in-line, atmospheric pressure deposition of wide area coatings. This, along with the ability to use aqueous salts rather than organic precursors or solvents makes it well suit...

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Published in: Surface and Coatings Technology
ISSN: 0257-8972
Published: Elsevier BV 2020
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URI: https://cronfa.swan.ac.uk/Record/cronfa53383
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first_indexed 2020-01-29T13:28:13Z
last_indexed 2020-09-17T03:16:37Z
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spelling 2020-01-29T10:32:46.0480078 v2 53383 2020-01-29 Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells 78a4cf80ab2fe6cca80716b5d357d8dd 0000-0002-6901-772X Simone Meroni Simone Meroni true false a210327b52472cfe8df9b8108d661457 0000-0002-8015-1436 Trystan Watson Trystan Watson true false 2020-01-29 MTLS Thin films of polycrystalline NiO were deposited by Flame Assisted Chemical Vapour Deposition, which is an ideal process for in-line, atmospheric pressure deposition of wide area coatings. This, along with the ability to use aqueous salts rather than organic precursors or solvents makes it well suited for industrial integration. To establish the capability of FACVD deposited NiO for use as a low cost, commercially viable option planar perovskite cells were fabricated under ambient conditions. The resulting cells showed the importance of both the flame composition and NiO thickness. A continuous NiO Hole Transport Layer (HTL) was achieved for ca. 36 nm thick film, which showed a maximum higher efficiency of 12.3% over that of the control (11.8%) which used a spin coated HTL. This was mainly driven by the large improvement in the current density from 16.6 mA/cm2 to 19.0 mA/cm2. Journal Article Surface and Coatings Technology 385 125423 Elsevier BV 0257-8972 FACVD; CVD; NiO; Perovskite; Hole transport 15 3 2020 2020-03-15 10.1016/j.surfcoat.2020.125423 COLLEGE NANME Materials Science and Engineering COLLEGE CODE MTLS Swansea University 2020-01-29T10:32:46.0480078 2020-01-29T10:32:46.0480078 Heather M. Yates 1 John L. Hodgkinson 2 Simone Meroni 0000-0002-6901-772X 3 David Richards 4 Trystan Watson 0000-0002-8015-1436 5 53383__16531__b2a0a16871f14ce3bc3e1a0119de2186.pdf 53383.pdf 2020-02-04T16:18:33.4204206 Output 4259726 application/pdf Accepted Manuscript true 2021-01-28T00:00:00.0000000 Released under the terms of a Creative Commons Attribution Non-Commercial No Derivatives License (CC-BY-NC-ND). true eng
title Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
spellingShingle Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
Simone Meroni
Trystan Watson
title_short Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
title_full Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
title_fullStr Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
title_full_unstemmed Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
title_sort Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
author_id_str_mv 78a4cf80ab2fe6cca80716b5d357d8dd
a210327b52472cfe8df9b8108d661457
author_id_fullname_str_mv 78a4cf80ab2fe6cca80716b5d357d8dd_***_Simone Meroni
a210327b52472cfe8df9b8108d661457_***_Trystan Watson
author Simone Meroni
Trystan Watson
author2 Heather M. Yates
John L. Hodgkinson
Simone Meroni
David Richards
Trystan Watson
format Journal article
container_title Surface and Coatings Technology
container_volume 385
container_start_page 125423
publishDate 2020
institution Swansea University
issn 0257-8972
doi_str_mv 10.1016/j.surfcoat.2020.125423
publisher Elsevier BV
document_store_str 1
active_str 0
description Thin films of polycrystalline NiO were deposited by Flame Assisted Chemical Vapour Deposition, which is an ideal process for in-line, atmospheric pressure deposition of wide area coatings. This, along with the ability to use aqueous salts rather than organic precursors or solvents makes it well suited for industrial integration. To establish the capability of FACVD deposited NiO for use as a low cost, commercially viable option planar perovskite cells were fabricated under ambient conditions. The resulting cells showed the importance of both the flame composition and NiO thickness. A continuous NiO Hole Transport Layer (HTL) was achieved for ca. 36 nm thick film, which showed a maximum higher efficiency of 12.3% over that of the control (11.8%) which used a spin coated HTL. This was mainly driven by the large improvement in the current density from 16.6 mA/cm2 to 19.0 mA/cm2.
published_date 2020-03-15T04:06:18Z
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