Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells

Yates, Heather M.; Hodgkinson, John L.; Meroni, Simone; Richards, David; Watson, Trystan

doi:10.1016/j.surfcoat.2020.125423

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Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells

Heather M. Yates, John L. Hodgkinson, Simone Meroni

, David Richards, Trystan Watson

Surface and Coatings Technology, Volume: 385, Start page: 125423

Swansea University Authors: Simone Meroni , Trystan Watson

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DOI (Published version): 10.1016/j.surfcoat.2020.125423

Abstract

Thin films of polycrystalline NiO were deposited by Flame Assisted Chemical Vapour Deposition, which is an ideal process for in-line, atmospheric pressure deposition of wide area coatings. This, along with the ability to use aqueous salts rather than organic precursors or solvents makes it well suit...

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Published in:	Surface and Coatings Technology
ISSN:	0257-8972 1879-3347
Published:	Elsevier BV 2020
Online Access:	Check full text
URI:	https://cronfa.swan.ac.uk/Record/cronfa53383

first_indexed	2020-01-29T13:28:13Z
last_indexed	2025-03-05T05:02:35Z
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spelling	2025-03-04T15:23:20.2940371 v2 53383 2020-01-29 Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells 78a4cf80ab2fe6cca80716b5d357d8dd 0000-0002-6901-772X Simone Meroni Simone Meroni true false a210327b52472cfe8df9b8108d661457 0000-0002-8015-1436 Trystan Watson Trystan Watson true false 2020-01-29 EAAS Thin films of polycrystalline NiO were deposited by Flame Assisted Chemical Vapour Deposition, which is an ideal process for in-line, atmospheric pressure deposition of wide area coatings. This, along with the ability to use aqueous salts rather than organic precursors or solvents makes it well suited for industrial integration. To establish the capability of FACVD deposited NiO for use as a low cost, commercially viable option planar perovskite cells were fabricated under ambient conditions. The resulting cells showed the importance of both the flame composition and NiO thickness. A continuous NiO Hole Transport Layer (HTL) was achieved for ca. 36 nm thick film, which showed a maximum higher efficiency of 12.3% over that of the control (11.8%) which used a spin coated HTL. This was mainly driven by the large improvement in the current density from 16.6 mA/cm2 to 19.0 mA/cm2. Journal Article Surface and Coatings Technology 385 125423 Elsevier BV 0257-8972 1879-3347 FACVD; CVD; NiO; Perovskite; Hole transport 15 3 2020 2020-03-15 10.1016/j.surfcoat.2020.125423 COLLEGE NANME Engineering and Applied Sciences School COLLEGE CODE EAAS Swansea University Not Required HY and JLH received funding from the European Union's Horizon 2020 research and innovation programme under grant agreement No. 653296 (CHEOPS). SM and TW received funding from the UKRI Global Challenge Research Fund project, SUNRISE (EP/P032591/1). DR and TW acknowledge the financial support provided by the M2A that has been made possible through funding from the European Social Fund via the Welsh Government, the Engineering and Physical Sciences Research Council (EP/L015099/1) and TATA Steel. XPS data collection was performed at the EPSRC National Facility for XPS (‘HarwellXPS’), operated by Cardiff University and UCL, under contract No. PR16195. G. Parr, Salford Analytical Services provided the SEM images. 2025-03-04T15:23:20.2940371 2020-01-29T10:32:46.0480078 Faculty of Science and Engineering School of Engineering and Applied Sciences - Materials Science and Engineering Heather M. Yates 1 John L. Hodgkinson 2 Simone Meroni 0000-0002-6901-772X 3 David Richards 4 Trystan Watson 0000-0002-8015-1436 5 53383__16531__b2a0a16871f14ce3bc3e1a0119de2186.pdf 53383.pdf 2020-02-04T16:18:33.4204206 Output 4259726 application/pdf Accepted Manuscript true 2021-01-28T00:00:00.0000000 Released under the terms of a Creative Commons Attribution Non-Commercial No Derivatives License (CC-BY-NC-ND). true eng
title	Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
spellingShingle	Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells Simone Meroni Trystan Watson
title_short	Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
title_full	Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
title_fullStr	Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
title_full_unstemmed	Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
title_sort	Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
author_id_str_mv	78a4cf80ab2fe6cca80716b5d357d8dd a210327b52472cfe8df9b8108d661457
author_id_fullname_str_mv	78a4cf80ab2fe6cca80716b5d357d8dd_*_Simone Meroni a210327b52472cfe8df9b8108d661457_*_Trystan Watson
author	Simone Meroni Trystan Watson
author2	Heather M. Yates John L. Hodgkinson Simone Meroni David Richards Trystan Watson
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container_title	Surface and Coatings Technology
container_volume	385
container_start_page	125423
publishDate	2020
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issn	0257-8972 1879-3347
doi_str_mv	10.1016/j.surfcoat.2020.125423
publisher	Elsevier BV
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description	Thin films of polycrystalline NiO were deposited by Flame Assisted Chemical Vapour Deposition, which is an ideal process for in-line, atmospheric pressure deposition of wide area coatings. This, along with the ability to use aqueous salts rather than organic precursors or solvents makes it well suited for industrial integration. To establish the capability of FACVD deposited NiO for use as a low cost, commercially viable option planar perovskite cells were fabricated under ambient conditions. The resulting cells showed the importance of both the flame composition and NiO thickness. A continuous NiO Hole Transport Layer (HTL) was achieved for ca. 36 nm thick film, which showed a maximum higher efficiency of 12.3% over that of the control (11.8%) which used a spin coated HTL. This was mainly driven by the large improvement in the current density from 16.6 mA/cm2 to 19.0 mA/cm2.
published_date	2020-03-15T07:43:49Z
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Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells

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