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Modelling and improving the vapour deposition efficiency of a novel PVD-based galvanising process / JAMES CARLOS

Swansea University Author: JAMES CARLOS

  • Redacted version - open access under embargo until: 16th July 2026

DOI (Published version): 10.23889/SUthesis.59492

Abstract

Physical vapour deposition (PVD) is being developed by Tata Steel as a continuous coating process for a steel substrate. Typically, the process is undertaken in low to medium vacuum conditions (0.001-0.1 Pa) to reduce contamination of the Zinc vapour and minimise impedance to the vapour flow towards...

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Published: Swansea 2021
Institution: Swansea University
Degree level: Doctoral
Degree name: EngD
Supervisor: Lavery, N. ; Penney, D. ; Zoestbergen, E. ; Commandeur C.
URI: https://cronfa.swan.ac.uk/Record/cronfa59492
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first_indexed 2022-03-04T11:06:11Z
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spelling 2022-03-04T11:40:46.0872347 v2 59492 2022-03-04 Modelling and improving the vapour deposition efficiency of a novel PVD-based galvanising process aa0332f655d4c5db5b8b4e1f79ecb0c9 JAMES CARLOS JAMES CARLOS true false 2022-03-04 Physical vapour deposition (PVD) is being developed by Tata Steel as a continuous coating process for a steel substrate. Typically, the process is undertaken in low to medium vacuum conditions (0.001-0.1 Pa) to reduce contamination of the Zinc vapour and minimise impedance to the vapour flow towards the substrate. This project centers around using computational models developed in OpenFOAM and ANSYS Fluent, to simulate PVD coating process with the aim of finding and optimising process parameters to enhance deposition yield. The lid-driven cavity benchmark model showed that the software packages mentioned, produced matching results to each other and against the benchmark data. Another benchmark, a vacuum interrupter model, was used to validate OpenFOAM’s DsmcFoam, which is a stochastic particle-based Direct Simulation Monte Carlo (DSMC) model. It allowed modelling of low pressure (high Knudsen number) flows and results showed similar deposition trends to the benchmark data. The inlet profile models focused on the coating uniformity and vapour distribution width. The models showed that an array of nozzles and slits produced wider deposition distribution when compared to a wide slit profile and, generally, nozzles produced a more uniform deposition distribution across the substrate when compared to slits. Additionally, for a specific inlet to substrate distance, nozzle spacing needs to be configured accordingly to ensure uniform deposition. For a gap of 20 mm, a nozzle spacing of either 6 and 10 mm; and for a 10 mm gap a spacing of 6 mm is suggested. Finally, the inlet to substrate models predicted coating yields of over 99% at low vacuum conditions (1-10 Pa). Generally, pressure is inversely proportional to the yield and in terms of reducing waste coating material, 10 Pa vacuum pressure is recommended. Moreover, the accretion model showed that coating chamber pressure is inversely proportional to the velocity of the vapour exiting the nozzle if the pressure of the vapour distribution box is kept constant. Importantly, the combination of these two models allowed the PVD coating process to be simulated through the transition to the continuum Knudsen regime. E-Thesis Swansea 16 7 2021 2021-07-16 10.23889/SUthesis.59492 A selection of third party content is redacted or is partially redacted from this thesis due to copyright restrictions. COLLEGE NANME COLLEGE CODE Swansea University Lavery, N. ; Penney, D. ; Zoestbergen, E. ; Commandeur C. Doctoral EngD M2A – European Social Fund; Tata Steel Europe 2022-03-04T11:40:46.0872347 2022-03-04T11:00:56.6526143 Faculty of Science and Engineering School of Engineering and Applied Sciences - Uncategorised JAMES CARLOS 1 Under embargo Under embargo 2022-03-04T11:38:29.4557948 Output 10020306 application/pdf Redacted version - open access true 2026-07-16T00:00:00.0000000 Copyright: The author, James P. Carlos, 2021. true eng
title Modelling and improving the vapour deposition efficiency of a novel PVD-based galvanising process
spellingShingle Modelling and improving the vapour deposition efficiency of a novel PVD-based galvanising process
JAMES CARLOS
title_short Modelling and improving the vapour deposition efficiency of a novel PVD-based galvanising process
title_full Modelling and improving the vapour deposition efficiency of a novel PVD-based galvanising process
title_fullStr Modelling and improving the vapour deposition efficiency of a novel PVD-based galvanising process
title_full_unstemmed Modelling and improving the vapour deposition efficiency of a novel PVD-based galvanising process
title_sort Modelling and improving the vapour deposition efficiency of a novel PVD-based galvanising process
author_id_str_mv aa0332f655d4c5db5b8b4e1f79ecb0c9
author_id_fullname_str_mv aa0332f655d4c5db5b8b4e1f79ecb0c9_***_JAMES CARLOS
author JAMES CARLOS
author2 JAMES CARLOS
format E-Thesis
publishDate 2021
institution Swansea University
doi_str_mv 10.23889/SUthesis.59492
college_str Faculty of Science and Engineering
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hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Uncategorised{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Uncategorised
document_store_str 0
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description Physical vapour deposition (PVD) is being developed by Tata Steel as a continuous coating process for a steel substrate. Typically, the process is undertaken in low to medium vacuum conditions (0.001-0.1 Pa) to reduce contamination of the Zinc vapour and minimise impedance to the vapour flow towards the substrate. This project centers around using computational models developed in OpenFOAM and ANSYS Fluent, to simulate PVD coating process with the aim of finding and optimising process parameters to enhance deposition yield. The lid-driven cavity benchmark model showed that the software packages mentioned, produced matching results to each other and against the benchmark data. Another benchmark, a vacuum interrupter model, was used to validate OpenFOAM’s DsmcFoam, which is a stochastic particle-based Direct Simulation Monte Carlo (DSMC) model. It allowed modelling of low pressure (high Knudsen number) flows and results showed similar deposition trends to the benchmark data. The inlet profile models focused on the coating uniformity and vapour distribution width. The models showed that an array of nozzles and slits produced wider deposition distribution when compared to a wide slit profile and, generally, nozzles produced a more uniform deposition distribution across the substrate when compared to slits. Additionally, for a specific inlet to substrate distance, nozzle spacing needs to be configured accordingly to ensure uniform deposition. For a gap of 20 mm, a nozzle spacing of either 6 and 10 mm; and for a 10 mm gap a spacing of 6 mm is suggested. Finally, the inlet to substrate models predicted coating yields of over 99% at low vacuum conditions (1-10 Pa). Generally, pressure is inversely proportional to the yield and in terms of reducing waste coating material, 10 Pa vacuum pressure is recommended. Moreover, the accretion model showed that coating chamber pressure is inversely proportional to the velocity of the vapour exiting the nozzle if the pressure of the vapour distribution box is kept constant. Importantly, the combination of these two models allowed the PVD coating process to be simulated through the transition to the continuum Knudsen regime.
published_date 2021-07-16T04:16:51Z
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score 11.017797

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