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Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon

Yen-Tien Lu, Andrew Barron Orcid Logo

Journal of Materials Chemistry A, Volume: 2, Issue: 30, Start page: 12043

Swansea University Author: Andrew Barron Orcid Logo

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DOI (Published version): 10.1039/C4TA02006E

Published in: Journal of Materials Chemistry A
Published: 2014
Online Access: http://pubs.rsc.org/en/Content/ArticleLanding/2014/TA/c4ta02006e#!divAbstract
URI: https://cronfa.swan.ac.uk/Record/cronfa22209
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first_indexed 2015-06-27T02:06:59Z
last_indexed 2018-02-09T05:00:27Z
id cronfa22209
recordtype SURis
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spelling 2015-06-26T16:17:31.1174265 v2 22209 2015-06-26 Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon 92e452f20936d688d36f91c78574241d 0000-0002-2018-8288 Andrew Barron Andrew Barron true false 2015-06-26 CHEG Journal Article Journal of Materials Chemistry A 2 30 12043 4 6 2014 2014-06-04 10.1039/C4TA02006E http://pubs.rsc.org/en/Content/ArticleLanding/2014/TA/c4ta02006e#!divAbstract COLLEGE NANME Chemical Engineering COLLEGE CODE CHEG Swansea University 2015-06-26T16:17:31.1174265 2015-06-26T16:17:31.1174265 Faculty of Science and Engineering School of Engineering and Applied Sciences - Chemical Engineering Yen-Tien Lu 1 Andrew Barron 0000-0002-2018-8288 2
title Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon
spellingShingle Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon
Andrew Barron
title_short Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon
title_full Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon
title_fullStr Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon
title_full_unstemmed Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon
title_sort Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon
author_id_str_mv 92e452f20936d688d36f91c78574241d
author_id_fullname_str_mv 92e452f20936d688d36f91c78574241d_***_Andrew Barron
author Andrew Barron
author2 Yen-Tien Lu
Andrew Barron
format Journal article
container_title Journal of Materials Chemistry A
container_volume 2
container_issue 30
container_start_page 12043
publishDate 2014
institution Swansea University
doi_str_mv 10.1039/C4TA02006E
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Chemical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Chemical Engineering
url http://pubs.rsc.org/en/Content/ArticleLanding/2014/TA/c4ta02006e#!divAbstract
document_store_str 0
active_str 0
published_date 2014-06-04T03:26:25Z
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score 11.012678

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