Journal article 726 views
Effects of film thickness and thermal treatment on the structural and opto-electronic properties of Ga-doped ZnO films deposited by sol–gel method
Solar Energy Materials and Solar Cells, Volume: 137, Pages: 202 - 209
Swansea University Author: Michael Warwick
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DOI (Published version): 10.1016/j.solmat.2015.02.016
Abstract
In this work, Ga-doped ZnO (GZO) films were prepared using the sol–gel dip coating method and the effects of film thickness (230–480 nm), heating temperature (400–600 °C) and atmosphere (air/argon) on the system structural and opto-electronic performances were investigated. The results show that hig...
Published in: | Solar Energy Materials and Solar Cells |
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ISSN: | 0927-0248 |
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2015
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URI: | https://cronfa.swan.ac.uk/Record/cronfa32762 |
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2017-04-03T13:21:26.0514160 v2 32762 2017-03-29 Effects of film thickness and thermal treatment on the structural and opto-electronic properties of Ga-doped ZnO films deposited by sol–gel method 9fdabb7283ffccc5898cc543305475cf 0000-0002-9028-1250 Michael Warwick Michael Warwick true false 2017-03-29 In this work, Ga-doped ZnO (GZO) films were prepared using the sol–gel dip coating method and the effects of film thickness (230–480 nm), heating temperature (400–600 °C) and atmosphere (air/argon) on the system structural and opto-electronic performances were investigated. The results show that highly c-axis oriented crystals could be easily formed in GZO coatings, which origins from a preferred nucleation and gets fully developed during the structure evolution. The increase of film thickness prolongs the sol–gel preheating process and promotes nucleation, resulting in a more crystalline film. Higher temperature annealing (600 °C) in air could degrade the Ga doping efficiency and decrease the carrier concentration, but the enlarged grain size helps enhance the carrier mobility and improve the film conductivity. Under the modified annealing process in argon, favorable carrier density (3.376×1019 cm−3) and mobility (15.74 cm2(V s)−1) can be obtained at the same time, resulting a minimum film resistivity of 1.18×10−2 Ω cm. The studied GZO coatings keep transparent in the visible and near infrared range, leading to high emissivity values (>0.738). We firstly prove that the carrier concentration could play a more dominant role than its mobility in determining the thermal emittance performance of thin films. Journal Article Solar Energy Materials and Solar Cells 137 202 209 0927-0248 Sol-gel; Ga-doped ZnO film; Thermal treatment; Emissivity 31 12 2015 2015-12-31 10.1016/j.solmat.2015.02.016 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000352670800027&KeyUID=WOS:000352670800027 COLLEGE NANME COLLEGE CODE Swansea University 2017-04-03T13:21:26.0514160 2017-03-29T09:52:54.8322953 Faculty of Science and Engineering School of Engineering and Applied Sciences - Uncategorised Shuqun Chen 1 Michael Warwick 0000-0002-9028-1250 2 Russell Binions 3 |
title |
Effects of film thickness and thermal treatment on the structural and opto-electronic properties of Ga-doped ZnO films deposited by sol–gel method |
spellingShingle |
Effects of film thickness and thermal treatment on the structural and opto-electronic properties of Ga-doped ZnO films deposited by sol–gel method Michael Warwick |
title_short |
Effects of film thickness and thermal treatment on the structural and opto-electronic properties of Ga-doped ZnO films deposited by sol–gel method |
title_full |
Effects of film thickness and thermal treatment on the structural and opto-electronic properties of Ga-doped ZnO films deposited by sol–gel method |
title_fullStr |
Effects of film thickness and thermal treatment on the structural and opto-electronic properties of Ga-doped ZnO films deposited by sol–gel method |
title_full_unstemmed |
Effects of film thickness and thermal treatment on the structural and opto-electronic properties of Ga-doped ZnO films deposited by sol–gel method |
title_sort |
Effects of film thickness and thermal treatment on the structural and opto-electronic properties of Ga-doped ZnO films deposited by sol–gel method |
author_id_str_mv |
9fdabb7283ffccc5898cc543305475cf |
author_id_fullname_str_mv |
9fdabb7283ffccc5898cc543305475cf_***_Michael Warwick |
author |
Michael Warwick |
author2 |
Shuqun Chen Michael Warwick Russell Binions |
format |
Journal article |
container_title |
Solar Energy Materials and Solar Cells |
container_volume |
137 |
container_start_page |
202 |
publishDate |
2015 |
institution |
Swansea University |
issn |
0927-0248 |
doi_str_mv |
10.1016/j.solmat.2015.02.016 |
college_str |
Faculty of Science and Engineering |
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|
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facultyofscienceandengineering |
hierarchy_top_title |
Faculty of Science and Engineering |
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facultyofscienceandengineering |
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Faculty of Science and Engineering |
department_str |
School of Engineering and Applied Sciences - Uncategorised{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Uncategorised |
url |
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000352670800027&KeyUID=WOS:000352670800027 |
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description |
In this work, Ga-doped ZnO (GZO) films were prepared using the sol–gel dip coating method and the effects of film thickness (230–480 nm), heating temperature (400–600 °C) and atmosphere (air/argon) on the system structural and opto-electronic performances were investigated. The results show that highly c-axis oriented crystals could be easily formed in GZO coatings, which origins from a preferred nucleation and gets fully developed during the structure evolution. The increase of film thickness prolongs the sol–gel preheating process and promotes nucleation, resulting in a more crystalline film. Higher temperature annealing (600 °C) in air could degrade the Ga doping efficiency and decrease the carrier concentration, but the enlarged grain size helps enhance the carrier mobility and improve the film conductivity. Under the modified annealing process in argon, favorable carrier density (3.376×1019 cm−3) and mobility (15.74 cm2(V s)−1) can be obtained at the same time, resulting a minimum film resistivity of 1.18×10−2 Ω cm. The studied GZO coatings keep transparent in the visible and near infrared range, leading to high emissivity values (>0.738). We firstly prove that the carrier concentration could play a more dominant role than its mobility in determining the thermal emittance performance of thin films. |
published_date |
2015-12-31T19:05:50Z |
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1821342905323749376 |
score |
11.04748 |