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Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films

Michael Warwick Orcid Logo, Russell Binions

Surface and Coatings Technology, Volume: 230, Pages: 28 - 32

Swansea University Author: Michael Warwick Orcid Logo

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DOI (Published version): 10.1016/j.surfcoat.2013.06.005

Abstract

Thin films of vanadium dioxide were deposited using a novel electric field assisted chemical vapor deposition methodology onto glass and gas sensor substrates. Electric fields were generated during the deposition reaction by applying a potential difference across the inter-digitated electrodes of th...

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Published in: Surface and Coatings Technology
ISSN: 0257-8972
Published: 2013
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URI: https://cronfa.swan.ac.uk/Record/cronfa32772
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first_indexed 2017-03-29T13:47:19Z
last_indexed 2018-02-09T05:21:03Z
id cronfa32772
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spelling 2017-04-03T13:32:42.1782873 v2 32772 2017-03-29 Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films 9fdabb7283ffccc5898cc543305475cf 0000-0002-9028-1250 Michael Warwick Michael Warwick true false 2017-03-29 FGSEN Thin films of vanadium dioxide were deposited using a novel electric field assisted chemical vapor deposition methodology onto glass and gas sensor substrates. Electric fields were generated during the deposition reaction by applying a potential difference across the inter-digitated electrodes of the gas sensor substrate or buy applying an electric field between two transparent conducting oxide coated glass substrates. The deposited films were analyzed and characterized using scanning electron microscopy, Raman spectroscopy, X-ray diffraction, atomic force microscopy and contact angle measurements. It was found that applying an electric field led to large changes in film microstructure, preferential orientation and changes in the film growth rate. This led to significant changes in materials properties such as increased surface roughness and enhanced wetting behaviour. Electric field-assisted chemical vapour deposition shows great promise as a method for nano-structuring and tailoring the properties of metal oxide thin films. Journal Article Surface and Coatings Technology 230 28 32 0257-8972 Nanostructured films; Electric field; CVD; VO2 31 12 2013 2013-12-31 10.1016/j.surfcoat.2013.06.005 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000323855700005&amp;KeyUID=WOS:000323855700005 COLLEGE NANME Science and Engineering - Faculty COLLEGE CODE FGSEN Swansea University 2017-04-03T13:32:42.1782873 2017-03-29T09:53:03.0691824 Faculty of Science and Engineering School of Engineering and Applied Sciences - Uncategorised Michael Warwick 0000-0002-9028-1250 1 Russell Binions 2
title Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films
spellingShingle Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films
Michael Warwick
title_short Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films
title_full Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films
title_fullStr Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films
title_full_unstemmed Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films
title_sort Electric field assisted aerosol assisted chemical vapor deposition of nanostructured metal oxide thin films
author_id_str_mv 9fdabb7283ffccc5898cc543305475cf
author_id_fullname_str_mv 9fdabb7283ffccc5898cc543305475cf_***_Michael Warwick
author Michael Warwick
author2 Michael Warwick
Russell Binions
format Journal article
container_title Surface and Coatings Technology
container_volume 230
container_start_page 28
publishDate 2013
institution Swansea University
issn 0257-8972
doi_str_mv 10.1016/j.surfcoat.2013.06.005
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Uncategorised{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Uncategorised
url http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000323855700005&amp;KeyUID=WOS:000323855700005
document_store_str 0
active_str 0
description Thin films of vanadium dioxide were deposited using a novel electric field assisted chemical vapor deposition methodology onto glass and gas sensor substrates. Electric fields were generated during the deposition reaction by applying a potential difference across the inter-digitated electrodes of the gas sensor substrate or buy applying an electric field between two transparent conducting oxide coated glass substrates. The deposited films were analyzed and characterized using scanning electron microscopy, Raman spectroscopy, X-ray diffraction, atomic force microscopy and contact angle measurements. It was found that applying an electric field led to large changes in film microstructure, preferential orientation and changes in the film growth rate. This led to significant changes in materials properties such as increased surface roughness and enhanced wetting behaviour. Electric field-assisted chemical vapour deposition shows great promise as a method for nano-structuring and tailoring the properties of metal oxide thin films.
published_date 2013-12-31T03:40:17Z
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score 11.012678

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