Journal article 560 views
Electric Fields And Chemical Vapor Deposition
Michael Warwick 
,
Richard Smith,
Neza Furlan,
Jared Crane,
Russell Binions,
D Misra,
DM Guldi,
RM Sankaran,
M Sunkara,
U Cvelbar
,
Richard Smith,
Neza Furlan,
Jared Crane,
Russell Binions,
D Misra,
DM Guldi,
RM Sankaran,
M Sunkara,
U Cvelbar
Thermal and Plasma Cvd of Nanostructures and Their Applications, Volume: 28
Swansea University Author:
Michael Warwick
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DOI (Published version): 10.1149/1.3490278
Abstract
Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report...
| Published in: | Thermal and Plasma Cvd of Nanostructures and Their Applications |
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| ISSN: | 1938-5862 |
| Published: |
2010
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa32783 |
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| Abstract: |
Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report how the incorporation of an applied electric field to AACVD reactions of vanadyl acetylacetonate in alcohols can influence the microstructure and growth of thin films of vanadium dioxide in unusual and sometimes unexpected ways. The films were characterized using scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman Spectroscopy. |
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| College: |
Faculty of Science and Engineering |