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Electric Fields And Chemical Vapor Deposition

Michael Warwick Orcid Logo, Richard Smith, Neza Furlan, Jared Crane, Russell Binions, D Misra, DM Guldi, RM Sankaran, M Sunkara, U Cvelbar

Thermal and Plasma Cvd of Nanostructures and Their Applications, Volume: 28

Swansea University Author: Michael Warwick Orcid Logo

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DOI (Published version): 10.1149/1.3490278

Abstract

Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report...

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Published in: Thermal and Plasma Cvd of Nanostructures and Their Applications
ISSN: 1938-5862
Published: 2010
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URI: https://cronfa.swan.ac.uk/Record/cronfa32783
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first_indexed 2017-03-29T13:47:21Z
last_indexed 2018-02-09T05:21:05Z
id cronfa32783
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spelling 2017-04-03T14:09:00.2737241 v2 32783 2017-03-29 Electric Fields And Chemical Vapor Deposition 9fdabb7283ffccc5898cc543305475cf 0000-0002-9028-1250 Michael Warwick Michael Warwick true false 2017-03-29 FGSEN Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report how the incorporation of an applied electric field to AACVD reactions of vanadyl acetylacetonate in alcohols can influence the microstructure and growth of thin films of vanadium dioxide in unusual and sometimes unexpected ways. The films were characterized using scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman Spectroscopy. Journal Article Thermal and Plasma Cvd of Nanostructures and Their Applications 28 1938-5862 31 12 2010 2010-12-31 10.1149/1.3490278 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000313491200001&amp;KeyUID=WOS:000313491200001 COLLEGE NANME Science and Engineering - Faculty COLLEGE CODE FGSEN Swansea University 2017-04-03T14:09:00.2737241 2017-03-29T09:53:13.6148993 Faculty of Science and Engineering School of Engineering and Applied Sciences - Uncategorised Michael Warwick 0000-0002-9028-1250 1 Richard Smith 2 Neza Furlan 3 Jared Crane 4 Russell Binions 5 D Misra 6 DM Guldi 7 RM Sankaran 8 M Sunkara 9 U Cvelbar 10
title Electric Fields And Chemical Vapor Deposition
spellingShingle Electric Fields And Chemical Vapor Deposition
Michael Warwick
title_short Electric Fields And Chemical Vapor Deposition
title_full Electric Fields And Chemical Vapor Deposition
title_fullStr Electric Fields And Chemical Vapor Deposition
title_full_unstemmed Electric Fields And Chemical Vapor Deposition
title_sort Electric Fields And Chemical Vapor Deposition
author_id_str_mv 9fdabb7283ffccc5898cc543305475cf
author_id_fullname_str_mv 9fdabb7283ffccc5898cc543305475cf_***_Michael Warwick
author Michael Warwick
author2 Michael Warwick
Richard Smith
Neza Furlan
Jared Crane
Russell Binions
D Misra
DM Guldi
RM Sankaran
M Sunkara
U Cvelbar
format Journal article
container_title Thermal and Plasma Cvd of Nanostructures and Their Applications
container_volume 28
publishDate 2010
institution Swansea University
issn 1938-5862
doi_str_mv 10.1149/1.3490278
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Uncategorised{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Uncategorised
url http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000313491200001&amp;KeyUID=WOS:000313491200001
document_store_str 0
active_str 0
description Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report how the incorporation of an applied electric field to AACVD reactions of vanadyl acetylacetonate in alcohols can influence the microstructure and growth of thin films of vanadium dioxide in unusual and sometimes unexpected ways. The films were characterized using scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman Spectroscopy.
published_date 2010-12-31T03:40:18Z
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score 11.035874

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