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Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition

Jean-Marc Bonard, Mirko Croci, Christian Klinke Orcid Logo, Fabien Conus, Imad Arfaoui, Thomas Stöckli, André Chatelain

Physical Review B, Volume: 67, Issue: 8

Swansea University Author: Christian Klinke Orcid Logo

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DOI (Published version): 10.1103/PhysRevB.67.085412

Published in: Physical Review B
ISSN: 1095-3795
Published: 2003
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URI: https://cronfa.swan.ac.uk/Record/cronfa36930
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first_indexed 2017-11-22T14:13:19Z
last_indexed 2018-02-09T05:29:47Z
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spelling 2017-11-22T11:54:32.7172549 v2 36930 2017-11-22 Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition c10c44238eabfb203111f88a965f5372 0000-0001-8558-7389 Christian Klinke Christian Klinke true false 2017-11-22 CHEM Journal Article Physical Review B 67 8 1095-3795 31 12 2003 2003-12-31 10.1103/PhysRevB.67.085412 COLLEGE NANME Chemistry COLLEGE CODE CHEM Swansea University 2017-11-22T11:54:32.7172549 2017-11-22T11:54:32.7328613 Faculty of Science and Engineering School of Engineering and Applied Sciences - Chemistry Jean-Marc Bonard 1 Mirko Croci 2 Christian Klinke 0000-0001-8558-7389 3 Fabien Conus 4 Imad Arfaoui 5 Thomas Stöckli 6 André Chatelain 7
title Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition
spellingShingle Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition
Christian Klinke
title_short Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition
title_full Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition
title_fullStr Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition
title_full_unstemmed Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition
title_sort Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition
author_id_str_mv c10c44238eabfb203111f88a965f5372
author_id_fullname_str_mv c10c44238eabfb203111f88a965f5372_***_Christian Klinke
author Christian Klinke
author2 Jean-Marc Bonard
Mirko Croci
Christian Klinke
Fabien Conus
Imad Arfaoui
Thomas Stöckli
André Chatelain
format Journal article
container_title Physical Review B
container_volume 67
container_issue 8
publishDate 2003
institution Swansea University
issn 1095-3795
doi_str_mv 10.1103/PhysRevB.67.085412
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Chemistry{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Chemistry
document_store_str 0
active_str 0
published_date 2003-12-31T03:46:21Z
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score 11.012678

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