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High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching

M. Aljada, K. Mutkins, G. Vamvounis, P. Burn, P. Meredith, Paul Meredith Orcid Logo

Journal of Micromechanics and Microengineering, Volume: 20, Issue: 7, Start page: 075037

Swansea University Author: Paul Meredith Orcid Logo

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Published in: Journal of Micromechanics and Microengineering
ISSN: 0960-1317 1361-6439
Published: 2010
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa38655
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College: College of Science
Issue: 7
Start Page: 075037