Journal article 732 views
High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
M. Aljada,
K. Mutkins,
G. Vamvounis,
P. Burn,
P. Meredith,
Paul Meredith 
Journal of Micromechanics and Microengineering, Volume: 20, Issue: 7, Start page: 075037
Swansea University Author:
Paul Meredith
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1088/0960-1317/20/7/075037
Abstract
High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
| Published in: | Journal of Micromechanics and Microengineering |
|---|---|
| ISSN: | 0960-1317 1361-6439 |
| Published: |
2010
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa38655 |
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| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
7 |
| Start Page: |
075037 |