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Exposure mechanism of fullerene derivative electron beam resists

A.P.G Robinson, R.E Palmer, T Tada, T Kanayama, E.J Shelley, D Philp, J.A Preece, Richard Palmer Orcid Logo

Chemical Physics Letters, Volume: 312, Issue: 5-6, Pages: 469 - 474

Swansea University Author: Richard Palmer Orcid Logo

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Published in: Chemical Physics Letters
ISSN: 00092614
Published: 1999
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49469
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College: College of Engineering
Issue: 5-6
Start Page: 469
End Page: 474