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A Fullerene derivative as an electron beam resist for nanolithography

A. P. G. Robinson, R. E. Palmer, T. Tada, T. Kanayama, J. A. Preece, Richard Palmer Orcid Logo

Applied Physics Letters, Volume: 72, Issue: 11, Pages: 1302 - 1304

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1063/1.120978

Published in: Applied Physics Letters
ISSN: 0003-6951 1077-3118
Published: 1998
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URI: https://cronfa.swan.ac.uk/Record/cronfa49480
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College: College of Engineering
Issue: 11
Start Page: 1302
End Page: 1304