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Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography

A. P. G. Robinson, R. E. Palmer, T. Tada, T. Kanayama, M. T. Allen, J. A. Preece, K. D. M. Harris, Richard Palmer Orcid Logo

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Volume: 18, Issue: 6, Start page: 2730

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1116/1.1322045

Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
ISSN: 0734211X
Published: 2000
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URI: https://cronfa.swan.ac.uk/Record/cronfa49456
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College: College of Engineering
Issue: 6
Start Page: 2730