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10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist
Richard Palmer 
Swansea University Author:
Richard Palmer
Abstract
10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist
| Published: |
1999
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49463 |
| College: |
Faculty of Science and Engineering |
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