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Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography
Thomas I. Wallow,
Christoph K. Hohle,
Andreas Frommhold,
Alexandra McClelland,
Dongxu Yang,
Richard Palmer 
,
John Roth,
Yasin Ekinci,
Mark C. Rosamund,
Alex P. G. Robinson
,
John Roth,
Yasin Ekinci,
Mark C. Rosamund,
Alex P. G. Robinson
Swansea University Author:
Richard Palmer
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DOI (Published version): 10.1117/12.2085672
Abstract
Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography
| Published: |
2015
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49254 |
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| College: |
Faculty of Science and Engineering |
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