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Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography

Thomas I. Wallow, Christoph K. Hohle, Andreas Frommhold, Alexandra McClelland, Dongxu Yang, Richard Palmer Orcid Logo, John Roth, Yasin Ekinci, Mark C. Rosamund, Alex P. G. Robinson

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.2085672

Published: 2015
URI: https://cronfa.swan.ac.uk/Record/cronfa49254
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College: College of Engineering