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Journal article 269 views

Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography

Thomas I. Wallow, Christoph K. Hohle, A. Frommhold, D. X. Yang, A. McClelland, X. Xue, Y. Ekinci, R. E. Palmer, A. P. G. Robinson, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.2046268

Published: 2014
URI: https://cronfa.swan.ac.uk/Record/cronfa49264
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College: College of Engineering