No Cover Image

Journal article 421 views

Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Xiang Xue, Yasin Ekinci, Richard Palmer Orcid Logo, Alex P. G. Robinson

Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume: 12, Issue: 3, Start page: 033010

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS
ISSN: 1932-5150
Published: 2013
Online Access: Check full text

Tags: Add Tag
No Tags, Be the first to tag this record!
College: Faculty of Science and Engineering
Issue: 3
Start Page: 033010