Journal article 644 views
Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
Andreas Frommhold,
Dongxu Yang,
Alexandra McClelland,
Xiang Xue,
Yasin Ekinci,
Richard Palmer 
,
Alex P. G. Robinson
,
Alex P. G. Robinson
Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume: 12, Issue: 3, Start page: 033010
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1117/1.JMM.12.3.033010
Abstract
Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
| Published in: | Journal of Micro/Nanolithography, MEMS, and MOEMS |
|---|---|
| ISSN: | 1932-5150 |
| Published: |
2013
|
| Online Access: |
Check full text
|
| URI: | https://cronfa.swan.ac.uk/Record/cronfa49273 |
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| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
3 |
| Start Page: |
033010 |