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Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Xiang Xue, Yasin Ekinci, Richard Palmer Orcid Logo, Alex P. G. Robinson

Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume: 12, Issue: 3, Start page: 033010

Swansea University Author: Richard Palmer Orcid Logo

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Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS
ISSN: 1932-5150
Published: 2013
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49273
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College: College of Engineering
Issue: 3
Start Page: 033010