Journal article 450 views
EUV lithography performance of negative-tone chemically amplified fullerene resist
Mark H. Somervell,
A. Frommhold,
D. X. Yang,
A. McClelland,
X. Xue,
R. E. Palmer,
A. P. G. Robinson,
Richard Palmer 
Swansea University Author:
Richard Palmer
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DOI (Published version): 10.1117/12.2011464
Abstract
EUV lithography performance of negative-tone chemically amplified fullerene resist
| Published: |
2013
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49270 |
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| College: |
Faculty of Science and Engineering |
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