No Cover Image

Journal article 582 views

EUV lithography performance of negative-tone chemically amplified fullerene resist

Mark H. Somervell, A. Frommhold, D. X. Yang, A. McClelland, X. Xue, R. E. Palmer, A. P. G. Robinson, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

DOI (Published version): 10.1117/12.2011464

Published: 2013
URI: https://cronfa.swan.ac.uk/Record/cronfa49270
Tags: Add Tag
No Tags, Be the first to tag this record!
College: Faculty of Science and Engineering