No Cover Image

Journal article 345 views

EUV lithography performance of negative-tone chemically amplified fullerene resist

Mark H. Somervell, A. Frommhold, D. X. Yang, A. McClelland, X. Xue, R. E. Palmer, A. P. G. Robinson, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

DOI (Published version): 10.1117/12.2011464

Published: 2013
URI: https://cronfa.swan.ac.uk/Record/cronfa49270
Tags: Add Tag
No Tags, Be the first to tag this record!
first_indexed 2019-03-18T20:01:32Z
last_indexed 2019-03-18T20:01:32Z
id cronfa49270
recordtype SURis
fullrecord <?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:30:07.6649644</datestamp><bib-version>v2</bib-version><id>49270</id><entry>2019-03-18</entry><title>EUV lithography performance of negative-tone chemically amplified fullerene resist</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>MECH</deptcode><abstract/><type>Journal Article</type><journal></journal><volume></volume><journalNumber></journalNumber><paginationStart/><paginationEnd/><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint/><issnElectronic/><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>2013</publishedYear><publishedDate>2013-12-31</publishedDate><doi>10.1117/12.2011464</doi><url/><notes/><college>COLLEGE NANME</college><department>Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>MECH</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:30:07.6649644</lastEdited><Created>2019-03-18T14:30:07.4589002</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>Mark H.</firstname><surname>Somervell</surname><order>1</order></author><author><firstname>A.</firstname><surname>Frommhold</surname><order>2</order></author><author><firstname>D. X.</firstname><surname>Yang</surname><order>3</order></author><author><firstname>A.</firstname><surname>McClelland</surname><order>4</order></author><author><firstname>X.</firstname><surname>Xue</surname><order>5</order></author><author><firstname>R. E.</firstname><surname>Palmer</surname><order>6</order></author><author><firstname>A. P. G.</firstname><surname>Robinson</surname><order>7</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>8</order></author></authors><documents/><OutputDurs/></rfc1807>
spelling 2019-03-18T14:30:07.6649644 v2 49270 2019-03-18 EUV lithography performance of negative-tone chemically amplified fullerene resist 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article 31 12 2013 2013-12-31 10.1117/12.2011464 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:30:07.6649644 2019-03-18T14:30:07.4589002 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Mark H. Somervell 1 A. Frommhold 2 D. X. Yang 3 A. McClelland 4 X. Xue 5 R. E. Palmer 6 A. P. G. Robinson 7 Richard Palmer 0000-0001-8728-8083 8
title EUV lithography performance of negative-tone chemically amplified fullerene resist
spellingShingle EUV lithography performance of negative-tone chemically amplified fullerene resist
Richard Palmer
title_short EUV lithography performance of negative-tone chemically amplified fullerene resist
title_full EUV lithography performance of negative-tone chemically amplified fullerene resist
title_fullStr EUV lithography performance of negative-tone chemically amplified fullerene resist
title_full_unstemmed EUV lithography performance of negative-tone chemically amplified fullerene resist
title_sort EUV lithography performance of negative-tone chemically amplified fullerene resist
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 Mark H. Somervell
A. Frommhold
D. X. Yang
A. McClelland
X. Xue
R. E. Palmer
A. P. G. Robinson
Richard Palmer
format Journal article
publishDate 2013
institution Swansea University
doi_str_mv 10.1117/12.2011464
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2013-12-31T04:00:08Z
_version_ 1763753074998902784
score 10.949942