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EUV lithography performance of negative-tone chemically amplified fullerene resist

Mark H. Somervell, A. Frommhold, D. X. Yang, A. McClelland, X. Xue, R. E. Palmer, A. P. G. Robinson, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.2011464

Published: 2013
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College: Faculty of Science and Engineering