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Positive tone chemically amplified fullerene resist

Mark H. Somervell, J. Manyam, A. Frommhold, D. X. Yang, A. McClelland, M. Manickam, J. A. Preece, R. E. Palmer, A. P. G. Robinson, Thomas I. Wallow, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.916472

Published: 2012
URI: https://cronfa.swan.ac.uk/Record/cronfa49291
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College: College of Engineering