Journal article 545 views
10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist
Swansea University Author: Richard Palmer
Abstract
10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist
Published: |
1999
|
---|---|
URI: | https://cronfa.swan.ac.uk/Record/cronfa49463 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
College: |
Faculty of Science and Engineering |
---|