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Band Structure, Band Offsets, and Intrinsic Defect Properties of Few-Layer Arsenic and Antimony
The Journal of Physical Chemistry C, Volume: 124, Issue: 13, Pages: 7441 - 7448
Swansea University Author: Yuzheng Guo
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DOI (Published version): 10.1021/acs.jpcc.9b11364
Abstract
We present a detailed first-principle study of few-layer arsenic and antimony electronic structures. The band structures of 2D arsenic and antimony are calculated by a hybrid functional with the spin–orbital coupling. The results show that the band gaps of arsenene (monolayer arsenic) and antimonene...
Published in: | The Journal of Physical Chemistry C |
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ISSN: | 1932-7447 1932-7455 |
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American Chemical Society (ACS)
2020
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URI: | https://cronfa.swan.ac.uk/Record/cronfa54161 |
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2021-09-09T17:21:23.5153041 v2 54161 2020-05-07 Band Structure, Band Offsets, and Intrinsic Defect Properties of Few-Layer Arsenic and Antimony 2c285ab01f88f7ecb25a3aacabee52ea 0000-0003-2656-0340 Yuzheng Guo Yuzheng Guo true false 2020-05-07 GENG We present a detailed first-principle study of few-layer arsenic and antimony electronic structures. The band structures of 2D arsenic and antimony are calculated by a hybrid functional with the spin–orbital coupling. The results show that the band gaps of arsenene (monolayer arsenic) and antimonene (monolayer antimony) are 1.93 and 1.52 eV, respectively. It is observed that the band gaps narrow in trilayer arsenic and bilayer antimony. The band alignment with HfO2 and other 2D materials is calculated to show that HfO2 is a good candidate as a gate oxide in field effect transistors. It is found that point defects such as a single vacancy or adatom will introduce several defect states in arsenene in the middle of the band gap. Meanwhile, the defect formation energy becomes negative when the Fermi level is close to the band edges. By comparison, the defect formation energy in antimonene is always positive so that the Fermi level pinning should be suppressed in contact with the reactive metal. Journal Article The Journal of Physical Chemistry C 124 13 7441 7448 American Chemical Society (ACS) 1932-7447 1932-7455 Antimony, Defects in solids, Defects, Arsenic, Electrical conductivity 2 4 2020 2020-04-02 10.1021/acs.jpcc.9b11364 COLLEGE NANME General Engineering COLLEGE CODE GENG Swansea University 2021-09-09T17:21:23.5153041 2020-05-07T10:13:32.6357104 Professional Services ISS - Uncategorised Yuanshuang Liu 1 Ting Wang 2 John Robertson 3 Jianbin Luo 4 Yuzheng Guo 0000-0003-2656-0340 5 Dameng Liu 6 54161__17204__6dd501d8c6ff4734aa7e92a18238b074.pdf 54161.pdf 2020-05-07T11:00:47.6392246 Output 1938945 application/pdf Accepted Manuscript true 2021-03-17T00:00:00.0000000 true eng |
title |
Band Structure, Band Offsets, and Intrinsic Defect Properties of Few-Layer Arsenic and Antimony |
spellingShingle |
Band Structure, Band Offsets, and Intrinsic Defect Properties of Few-Layer Arsenic and Antimony Yuzheng Guo |
title_short |
Band Structure, Band Offsets, and Intrinsic Defect Properties of Few-Layer Arsenic and Antimony |
title_full |
Band Structure, Band Offsets, and Intrinsic Defect Properties of Few-Layer Arsenic and Antimony |
title_fullStr |
Band Structure, Band Offsets, and Intrinsic Defect Properties of Few-Layer Arsenic and Antimony |
title_full_unstemmed |
Band Structure, Band Offsets, and Intrinsic Defect Properties of Few-Layer Arsenic and Antimony |
title_sort |
Band Structure, Band Offsets, and Intrinsic Defect Properties of Few-Layer Arsenic and Antimony |
author_id_str_mv |
2c285ab01f88f7ecb25a3aacabee52ea |
author_id_fullname_str_mv |
2c285ab01f88f7ecb25a3aacabee52ea_***_Yuzheng Guo |
author |
Yuzheng Guo |
author2 |
Yuanshuang Liu Ting Wang John Robertson Jianbin Luo Yuzheng Guo Dameng Liu |
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Journal article |
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The Journal of Physical Chemistry C |
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124 |
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13 |
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7441 |
publishDate |
2020 |
institution |
Swansea University |
issn |
1932-7447 1932-7455 |
doi_str_mv |
10.1021/acs.jpcc.9b11364 |
publisher |
American Chemical Society (ACS) |
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Professional Services |
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ISS - Uncategorised{{{_:::_}}}Professional Services{{{_:::_}}}ISS - Uncategorised |
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description |
We present a detailed first-principle study of few-layer arsenic and antimony electronic structures. The band structures of 2D arsenic and antimony are calculated by a hybrid functional with the spin–orbital coupling. The results show that the band gaps of arsenene (monolayer arsenic) and antimonene (monolayer antimony) are 1.93 and 1.52 eV, respectively. It is observed that the band gaps narrow in trilayer arsenic and bilayer antimony. The band alignment with HfO2 and other 2D materials is calculated to show that HfO2 is a good candidate as a gate oxide in field effect transistors. It is found that point defects such as a single vacancy or adatom will introduce several defect states in arsenene in the middle of the band gap. Meanwhile, the defect formation energy becomes negative when the Fermi level is close to the band edges. By comparison, the defect formation energy in antimonene is always positive so that the Fermi level pinning should be suppressed in contact with the reactive metal. |
published_date |
2020-04-02T04:07:30Z |
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1763753539264315392 |
score |
11.036706 |