No Cover Image

Journal article 332 views 43 downloads

Thickness Effect on the Solid-State Reaction of a Ni/GaAs System

Selma Rabhi, Nouredine Oueldna Orcid Logo, Carine Perrin-Pellegrino, Alain Portavoce, Karol Kalna Orcid Logo, Mohamed Cherif Benoudia Orcid Logo, Khalid Hoummada

Nanomaterials, Volume: 12, Issue: 15, Start page: 2633

Swansea University Author: Karol Kalna Orcid Logo

  • 61169_VoR.pdf

    PDF | Version of Record

    © 2022 by the authors. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license

    Download (4.22MB)

Check full text

DOI (Published version): 10.3390/nano12152633

Abstract

Ni thin films with different thicknesses were grown on a GaAs substrate using the magnetron sputtering technique followed by in situ X-ray diffraction (XRD) annealing in order to study the solid-state reaction between Ni and GaAs substrate. The thickness dependence on the formation of the intermetal...

Full description

Published in: Nanomaterials
ISSN: 2079-4991
Published: MDPI AG 2022
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa61169
Tags: Add Tag
No Tags, Be the first to tag this record!
first_indexed 2022-10-06T14:34:44Z
last_indexed 2023-01-13T19:21:46Z
id cronfa61169
recordtype SURis
fullrecord <?xml version="1.0"?><rfc1807><datestamp>2022-10-06T15:39:39.7319442</datestamp><bib-version>v2</bib-version><id>61169</id><entry>2022-09-09</entry><title>Thickness Effect on the Solid-State Reaction of a Ni/GaAs System</title><swanseaauthors><author><sid>1329a42020e44fdd13de2f20d5143253</sid><ORCID>0000-0002-6333-9189</ORCID><firstname>Karol</firstname><surname>Kalna</surname><name>Karol Kalna</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2022-09-09</date><deptcode>EEEG</deptcode><abstract>Ni thin films with different thicknesses were grown on a GaAs substrate using the magnetron sputtering technique followed by in situ X-ray diffraction (XRD) annealing in order to study the solid-state reaction between Ni and GaAs substrate. The thickness dependence on the formation of the intermetallic phases was investigated using in situ and ex situ XRD, pole figures, and atom probe tomography (APT). The results indicate that the 20 nm-thick Ni film exhibits an epitaxial relation with the GaAs substrate, which is (001) Ni//(001) GaAs and [111] Ni//[110] GaAs after deposition. Increasing the film&#x2019;s thickness results in a change of the Ni film&#x2019;s texture. This difference has an impact on the formation temperature of Ni3GaAs. This temperature decreases simultaneously with the thickness increase. This is due to the coherent/incoherent nature of the initial Ni/GaAs interface. The Ni3GaAs phase decomposes into the binary and ternary compounds xNiAs and Ni3&#x2212;xGaAs1&#x2212;x at about 400 &#xB0;C. Similarly to Ni3GaAs, the decomposition temperature of the second phase also depends on the initial thickness of the Ni layer.</abstract><type>Journal Article</type><journal>Nanomaterials</journal><volume>12</volume><journalNumber>15</journalNumber><paginationStart>2633</paginationStart><paginationEnd/><publisher>MDPI AG</publisher><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint/><issnElectronic>2079-4991</issnElectronic><keywords>solid-state reaction; thickness; Ni-thin films; III-IV semi-conductors; in situ X-ray diffraction; intermetallic growth</keywords><publishedDay>30</publishedDay><publishedMonth>7</publishedMonth><publishedYear>2022</publishedYear><publishedDate>2022-07-30</publishedDate><doi>10.3390/nano12152633</doi><url/><notes/><college>COLLEGE NANME</college><department>Electronic and Electrical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>EEEG</DepartmentCode><institution>Swansea University</institution><apcterm/><funders>This research was funded by Campus France PHC Toubkal&#x2014;grant number: TBK 18/65, PHC Tassili&#x2014;grant number: 7MDU994, and &#x201C;The APC was funded by Aix-Marseille University&#x201D;.</funders><projectreference/><lastEdited>2022-10-06T15:39:39.7319442</lastEdited><Created>2022-09-09T14:34:12.4996184</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Electronic and Electrical Engineering</level></path><authors><author><firstname>Selma</firstname><surname>Rabhi</surname><order>1</order></author><author><firstname>Nouredine</firstname><surname>Oueldna</surname><orcid>0000-0002-6127-0712</orcid><order>2</order></author><author><firstname>Carine</firstname><surname>Perrin-Pellegrino</surname><order>3</order></author><author><firstname>Alain</firstname><surname>Portavoce</surname><order>4</order></author><author><firstname>Karol</firstname><surname>Kalna</surname><orcid>0000-0002-6333-9189</orcid><order>5</order></author><author><firstname>Mohamed Cherif</firstname><surname>Benoudia</surname><orcid>0000-0002-7506-256x</orcid><order>6</order></author><author><firstname>Khalid</firstname><surname>Hoummada</surname><order>7</order></author></authors><documents><document><filename>61169__25337__68a4ee1d498c4d14a980fdde1d3e7d25.pdf</filename><originalFilename>61169_VoR.pdf</originalFilename><uploaded>2022-10-06T15:35:10.8314822</uploaded><type>Output</type><contentLength>4420361</contentLength><contentType>application/pdf</contentType><version>Version of Record</version><cronfaStatus>true</cronfaStatus><documentNotes>&#xA9; 2022 by the authors. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license</documentNotes><copyrightCorrect>true</copyrightCorrect><language>eng</language><licence>https://creativecommons.org/licenses/by/4.0/</licence></document></documents><OutputDurs/></rfc1807>
spelling 2022-10-06T15:39:39.7319442 v2 61169 2022-09-09 Thickness Effect on the Solid-State Reaction of a Ni/GaAs System 1329a42020e44fdd13de2f20d5143253 0000-0002-6333-9189 Karol Kalna Karol Kalna true false 2022-09-09 EEEG Ni thin films with different thicknesses were grown on a GaAs substrate using the magnetron sputtering technique followed by in situ X-ray diffraction (XRD) annealing in order to study the solid-state reaction between Ni and GaAs substrate. The thickness dependence on the formation of the intermetallic phases was investigated using in situ and ex situ XRD, pole figures, and atom probe tomography (APT). The results indicate that the 20 nm-thick Ni film exhibits an epitaxial relation with the GaAs substrate, which is (001) Ni//(001) GaAs and [111] Ni//[110] GaAs after deposition. Increasing the film’s thickness results in a change of the Ni film’s texture. This difference has an impact on the formation temperature of Ni3GaAs. This temperature decreases simultaneously with the thickness increase. This is due to the coherent/incoherent nature of the initial Ni/GaAs interface. The Ni3GaAs phase decomposes into the binary and ternary compounds xNiAs and Ni3−xGaAs1−x at about 400 °C. Similarly to Ni3GaAs, the decomposition temperature of the second phase also depends on the initial thickness of the Ni layer. Journal Article Nanomaterials 12 15 2633 MDPI AG 2079-4991 solid-state reaction; thickness; Ni-thin films; III-IV semi-conductors; in situ X-ray diffraction; intermetallic growth 30 7 2022 2022-07-30 10.3390/nano12152633 COLLEGE NANME Electronic and Electrical Engineering COLLEGE CODE EEEG Swansea University This research was funded by Campus France PHC Toubkal—grant number: TBK 18/65, PHC Tassili—grant number: 7MDU994, and “The APC was funded by Aix-Marseille University”. 2022-10-06T15:39:39.7319442 2022-09-09T14:34:12.4996184 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Electronic and Electrical Engineering Selma Rabhi 1 Nouredine Oueldna 0000-0002-6127-0712 2 Carine Perrin-Pellegrino 3 Alain Portavoce 4 Karol Kalna 0000-0002-6333-9189 5 Mohamed Cherif Benoudia 0000-0002-7506-256x 6 Khalid Hoummada 7 61169__25337__68a4ee1d498c4d14a980fdde1d3e7d25.pdf 61169_VoR.pdf 2022-10-06T15:35:10.8314822 Output 4420361 application/pdf Version of Record true © 2022 by the authors. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license true eng https://creativecommons.org/licenses/by/4.0/
title Thickness Effect on the Solid-State Reaction of a Ni/GaAs System
spellingShingle Thickness Effect on the Solid-State Reaction of a Ni/GaAs System
Karol Kalna
title_short Thickness Effect on the Solid-State Reaction of a Ni/GaAs System
title_full Thickness Effect on the Solid-State Reaction of a Ni/GaAs System
title_fullStr Thickness Effect on the Solid-State Reaction of a Ni/GaAs System
title_full_unstemmed Thickness Effect on the Solid-State Reaction of a Ni/GaAs System
title_sort Thickness Effect on the Solid-State Reaction of a Ni/GaAs System
author_id_str_mv 1329a42020e44fdd13de2f20d5143253
author_id_fullname_str_mv 1329a42020e44fdd13de2f20d5143253_***_Karol Kalna
author Karol Kalna
author2 Selma Rabhi
Nouredine Oueldna
Carine Perrin-Pellegrino
Alain Portavoce
Karol Kalna
Mohamed Cherif Benoudia
Khalid Hoummada
format Journal article
container_title Nanomaterials
container_volume 12
container_issue 15
container_start_page 2633
publishDate 2022
institution Swansea University
issn 2079-4991
doi_str_mv 10.3390/nano12152633
publisher MDPI AG
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Electronic and Electrical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Electronic and Electrical Engineering
document_store_str 1
active_str 0
description Ni thin films with different thicknesses were grown on a GaAs substrate using the magnetron sputtering technique followed by in situ X-ray diffraction (XRD) annealing in order to study the solid-state reaction between Ni and GaAs substrate. The thickness dependence on the formation of the intermetallic phases was investigated using in situ and ex situ XRD, pole figures, and atom probe tomography (APT). The results indicate that the 20 nm-thick Ni film exhibits an epitaxial relation with the GaAs substrate, which is (001) Ni//(001) GaAs and [111] Ni//[110] GaAs after deposition. Increasing the film’s thickness results in a change of the Ni film’s texture. This difference has an impact on the formation temperature of Ni3GaAs. This temperature decreases simultaneously with the thickness increase. This is due to the coherent/incoherent nature of the initial Ni/GaAs interface. The Ni3GaAs phase decomposes into the binary and ternary compounds xNiAs and Ni3−xGaAs1−x at about 400 °C. Similarly to Ni3GaAs, the decomposition temperature of the second phase also depends on the initial thickness of the Ni layer.
published_date 2022-07-30T04:19:49Z
_version_ 1763754313384984576
score 11.016235