Journal article 610 views
The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions
,
Richard Smith,
Neza Furlan,
Russell Binions
Journal of The Electrochemical Society, Volume: 158, Issue: 2, Start page: D62
Swansea University Author:
Michael Warwick
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1149/1.3519870
Abstract
Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report...
| Published in: | Journal of The Electrochemical Society |
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| ISSN: | 0013-4651 |
| Published: |
2011
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| Online Access: |
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa32782 |
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| Abstract: |
Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report how the incorporation of an applied electric field to aerosol assisted chemical vapor deposition reactions of vanadyl acetylacetonate in alcohols can influence the microstructure and growth of thin films of vanadium dioxide in unusual and sometimes unexpected ways. The films were characterized using scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and Raman spectroscopy. |
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| Keywords: |
chemical vapour deposition, crystal microstructure, Raman spectra, scanning electron microscopy, thin films, vanadium compounds, X-ray diffraction, X-ray photoelectron spectra |
| College: |
Faculty of Science and Engineering |
| Issue: |
2 |
| Start Page: |
D62 |