No Cover Image

Journal article 610 views

The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions

Jared Crane, Michael Warwick Orcid Logo, Richard Smith, Neza Furlan, Russell Binions

Journal of The Electrochemical Society, Volume: 158, Issue: 2, Start page: D62

Swansea University Author: Michael Warwick Orcid Logo

Full text not available from this repository: check for access using links below.

Check full text

DOI (Published version): 10.1149/1.3519870

Abstract

Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report...

Full description

Published in: Journal of The Electrochemical Society
ISSN: 0013-4651
Published: 2011
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa32782
Tags: Add Tag
No Tags, Be the first to tag this record!
first_indexed 2017-03-29T13:47:21Z
last_indexed 2018-02-09T05:21:05Z
id cronfa32782
recordtype SURis
fullrecord <?xml version="1.0"?><rfc1807><datestamp>2017-04-03T14:06:57.1728088</datestamp><bib-version>v2</bib-version><id>32782</id><entry>2017-03-29</entry><title>The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions</title><swanseaauthors><author><sid>9fdabb7283ffccc5898cc543305475cf</sid><ORCID>0000-0002-9028-1250</ORCID><firstname>Michael</firstname><surname>Warwick</surname><name>Michael Warwick</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2017-03-29</date><deptcode>FGSEN</deptcode><abstract>Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report how the incorporation of an applied electric field to aerosol assisted chemical vapor deposition reactions of vanadyl acetylacetonate in alcohols can influence the microstructure and growth of thin films of vanadium dioxide in unusual and sometimes unexpected ways. The films were characterized using scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and Raman spectroscopy.</abstract><type>Journal Article</type><journal>Journal of The Electrochemical Society</journal><volume>158</volume><journalNumber>2</journalNumber><paginationStart>D62</paginationStart><publisher/><issnPrint>0013-4651</issnPrint><keywords>chemical vapour deposition, crystal microstructure, Raman spectra, scanning electron microscopy, thin films, vanadium compounds, X-ray diffraction, X-ray photoelectron spectra</keywords><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>2011</publishedYear><publishedDate>2011-12-31</publishedDate><doi>10.1149/1.3519870</doi><url>http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;amp;SrcAuth=ORCID&amp;amp;SrcApp=OrcidOrg&amp;amp;DestLinkType=FullRecord&amp;amp;DestApp=WOS_CPL&amp;amp;KeyUT=WOS:000285765600054&amp;amp;KeyUID=WOS:000285765600054</url><notes/><college>COLLEGE NANME</college><department>Science and Engineering - Faculty</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>FGSEN</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2017-04-03T14:06:57.1728088</lastEdited><Created>2017-03-29T09:53:12.6009184</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Engineering and Applied Sciences - Uncategorised</level></path><authors><author><firstname>Jared</firstname><surname>Crane</surname><order>1</order></author><author><firstname>Michael</firstname><surname>Warwick</surname><orcid>0000-0002-9028-1250</orcid><order>2</order></author><author><firstname>Richard</firstname><surname>Smith</surname><order>3</order></author><author><firstname>Neza</firstname><surname>Furlan</surname><order>4</order></author><author><firstname>Russell</firstname><surname>Binions</surname><order>5</order></author></authors><documents/><OutputDurs/></rfc1807>
spelling 2017-04-03T14:06:57.1728088 v2 32782 2017-03-29 The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions 9fdabb7283ffccc5898cc543305475cf 0000-0002-9028-1250 Michael Warwick Michael Warwick true false 2017-03-29 FGSEN Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report how the incorporation of an applied electric field to aerosol assisted chemical vapor deposition reactions of vanadyl acetylacetonate in alcohols can influence the microstructure and growth of thin films of vanadium dioxide in unusual and sometimes unexpected ways. The films were characterized using scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and Raman spectroscopy. Journal Article Journal of The Electrochemical Society 158 2 D62 0013-4651 chemical vapour deposition, crystal microstructure, Raman spectra, scanning electron microscopy, thin films, vanadium compounds, X-ray diffraction, X-ray photoelectron spectra 31 12 2011 2011-12-31 10.1149/1.3519870 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000285765600054&amp;KeyUID=WOS:000285765600054 COLLEGE NANME Science and Engineering - Faculty COLLEGE CODE FGSEN Swansea University 2017-04-03T14:06:57.1728088 2017-03-29T09:53:12.6009184 Faculty of Science and Engineering School of Engineering and Applied Sciences - Uncategorised Jared Crane 1 Michael Warwick 0000-0002-9028-1250 2 Richard Smith 3 Neza Furlan 4 Russell Binions 5
title The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions
spellingShingle The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions
Michael Warwick
title_short The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions
title_full The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions
title_fullStr The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions
title_full_unstemmed The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions
title_sort The Application of Electric Fields to Aerosol Assisted Chemical Vapor Deposition Reactions
author_id_str_mv 9fdabb7283ffccc5898cc543305475cf
author_id_fullname_str_mv 9fdabb7283ffccc5898cc543305475cf_***_Michael Warwick
author Michael Warwick
author2 Jared Crane
Michael Warwick
Richard Smith
Neza Furlan
Russell Binions
format Journal article
container_title Journal of The Electrochemical Society
container_volume 158
container_issue 2
container_start_page D62
publishDate 2011
institution Swansea University
issn 0013-4651
doi_str_mv 10.1149/1.3519870
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Uncategorised{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Uncategorised
url http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000285765600054&amp;KeyUID=WOS:000285765600054
document_store_str 0
active_str 0
description Chemical vapor deposition methodologies are widely employed in a variety of fields such as microelectronics and glazing. Control of film growth and microstructure, and hence film properties, may be limited by precursor properties such as volatility or decomposition chemistry. In this paper we report how the incorporation of an applied electric field to aerosol assisted chemical vapor deposition reactions of vanadyl acetylacetonate in alcohols can influence the microstructure and growth of thin films of vanadium dioxide in unusual and sometimes unexpected ways. The films were characterized using scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and Raman spectroscopy.
published_date 2011-12-31T03:40:18Z
_version_ 1763751827267911680
score 11.036116

Similar Items