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Organic Hard Masks Utilizing Fullerene Derivatives

Thomas I. Wallow, Christoph K. Hohle, Andreas Frommhold, Alan G. Brown, Richard Palmer Orcid Logo, Tom Lada, Alex P. Robinson

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.2085675

Published: 2015
URI: https://cronfa.swan.ac.uk/Record/cronfa49246
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College: College of Engineering