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Chemically amplified phenolic fullerene electron beam resist

D. X. Yang, A. Frommhold, X. Xue, R. E. Palmer, A. P. G. Robinson, Richard Palmer Orcid Logo

Journal of Materials Chemistry C, Volume: 2, Issue: 8, Start page: 1505

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1039/c3tc31896f

Published in: Journal of Materials Chemistry C
ISSN: 2050-7526 2050-7534
Published: 2014
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URI: https://cronfa.swan.ac.uk/Record/cronfa49259
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College: College of Engineering
Issue: 8
Start Page: 1505