No Cover Image

Journal article 337 views

Chemically amplified molecular resists for electron beam lithography

A.P.G. Robinson, H.M. Zaid, F.P. Gibbons, R.E. Palmer, M. Manickam, J.A. Preece, R. Brainard, T. Zampini, K. O’Connell, Richard Palmer Orcid Logo

Microelectronic Engineering, Volume: 83, Issue: 4-9, Pages: 1115 - 1118

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

Published in: Microelectronic Engineering
ISSN: 01679317
Published: 2006
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49350
Tags: Add Tag
No Tags, Be the first to tag this record!
College: College of Engineering
Issue: 4-9
Start Page: 1115
End Page: 1118