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Chemically amplified molecular resists for electron beam lithography

A.P.G. Robinson, H.M. Zaid, F.P. Gibbons, R.E. Palmer, M. Manickam, J.A. Preece, R. Brainard, T. Zampini, K. O’Connell, Richard Palmer Orcid Logo

Microelectronic Engineering, Volume: 83, Issue: 4-9, Pages: 1115 - 1118

Swansea University Author: Richard Palmer Orcid Logo

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Published in: Microelectronic Engineering
ISSN: 01679317
Published: 2006
Online Access: Check full text

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College: Faculty of Science and Engineering
Issue: 4-9
Start Page: 1115
End Page: 1118