Journal article 496 views
Chemically amplified molecular resists for electron beam lithography
A.P.G. Robinson,
H.M. Zaid,
F.P. Gibbons,
R.E. Palmer,
M. Manickam,
J.A. Preece,
R. Brainard,
T. Zampini,
K. O’Connell,
Richard Palmer 
Microelectronic Engineering, Volume: 83, Issue: 4-9, Pages: 1115 - 1118
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1016/j.mee.2006.01.151
Abstract
Chemically amplified molecular resists for electron beam lithography
| Published in: | Microelectronic Engineering |
|---|---|
| ISSN: | 01679317 |
| Published: |
2006
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49350 |
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| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
4-9 |
| Start Page: |
1115 |
| End Page: |
1118 |