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Electrochemically copper-doped bismuth tellurium selenide thin films

Matthew Burton Orcid Logo, Andrew J. Naylor, Iris S. Nandhakumar

Electrochemistry Communications, Volume: 97, Pages: 56 - 59

Swansea University Author: Matthew Burton Orcid Logo

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Abstract

We report the first results of a study on electrochemically doped copper bismuth tellurium selenide thin films electrodeposited from aqueous nitric acid electrolytes containing up to 2 mM of Cu(NO3)2. The effect of Cu(NO3)2 concentration on the composition, structure and thermoelectric properties of...

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Published in: Electrochemistry Communications
ISSN: 1388-2481
Published: Elsevier BV 2018
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa50234
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Abstract: We report the first results of a study on electrochemically doped copper bismuth tellurium selenide thin films electrodeposited from aqueous nitric acid electrolytes containing up to 2 mM of Cu(NO3)2. The effect of Cu(NO3)2 concentration on the composition, structure and thermoelectric properties of the bismuth tellurium selenide films is investigated by scanning electron microscopy, energy-dispersive X-ray spectroscopy, X-ray diffraction and Seebeck and Hall effect measurements. A Cu(NO3)2 concentration of 1.5 mM is found to offer a Seebeck coefficient of up to −390 μV K−1 at room temperature, which is the highest reported to date for an electrodeposited bismuth tellurium compound.
Keywords: Bismuth tellurium selenide, Electrodeposition, Thin films, Copper doping, Thermoelectrics
College: College of Engineering
Start Page: 56
End Page: 59