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Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel

C. Lei, M. Burton, Iris S. Nandhakumar, Matthew Burton Orcid Logo

Journal of The Electrochemical Society, Volume: 164, Issue: 4, Pages: D192 - D195

Swansea University Author: Matthew Burton Orcid Logo

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DOI (Published version): 10.1149/2.1151704jes

Abstract

Bismuth-telluride-based alloys are currently the best commercially available thermoelectric materials for applications at room temperatures. Up to 150 micron thick layers of bismuth antimony telluride (Bi0.5Sb1.5Te3) were directly deposited onto nickel by either potenstiostatic or potentiodynamic el...

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Published in: Journal of The Electrochemical Society
ISSN: 0013-4651 1945-7111
Published: 2017
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URI: https://cronfa.swan.ac.uk/Record/cronfa50239
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first_indexed 2019-05-09T20:01:17Z
last_indexed 2019-07-18T21:34:51Z
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spelling 2019-07-18T14:49:25.1773700 v2 50239 2019-05-07 Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel 2deade2806e39b1f749e9cf67ac640b2 0000-0002-0376-6322 Matthew Burton Matthew Burton true false 2019-05-07 MTLS Bismuth-telluride-based alloys are currently the best commercially available thermoelectric materials for applications at room temperatures. Up to 150 micron thick layers of bismuth antimony telluride (Bi0.5Sb1.5Te3) were directly deposited onto nickel by either potenstiostatic or potentiodynamic electrodeposition. Cyclic voltammetry was employed to identify the optimal deposition potential. The films were characterized by scanning electron microscopy, energy dispersive X-rays and X-ray diffraction. The p-type films were found to be well adherent, uniform and stoichiometric with a high power factor of 2.3 × 10−4 W m−1 K−2 at film growth rates of up to 40 μm h−1. Journal Article Journal of The Electrochemical Society 164 4 D192 D195 0013-4651 1945-7111 bismuth antimony telluride, electrodeposition, nickel, p-type, thermoelectrics, thick films 31 12 2017 2017-12-31 10.1149/2.1151704jes COLLEGE NANME Materials Science and Engineering COLLEGE CODE MTLS Swansea University 2019-07-18T14:49:25.1773700 2019-05-07T09:57:01.9794580 Faculty of Science and Engineering School of Engineering and Applied Sciences - Materials Science and Engineering C. Lei 1 M. Burton 2 Iris S. Nandhakumar 3 Matthew Burton 0000-0002-0376-6322 4 0050239-13052019105148.pdf lei2017.pdf 2019-05-13T10:51:48.8700000 Output 2480738 application/pdf Version of Record true 2019-05-13T00:00:00.0000000 Distributed under the terms of a Creative Commons Attribution (CC-BY-4.0) true eng
title Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
spellingShingle Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
Matthew Burton
title_short Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
title_full Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
title_fullStr Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
title_full_unstemmed Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
title_sort Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
author_id_str_mv 2deade2806e39b1f749e9cf67ac640b2
author_id_fullname_str_mv 2deade2806e39b1f749e9cf67ac640b2_***_Matthew Burton
author Matthew Burton
author2 C. Lei
M. Burton
Iris S. Nandhakumar
Matthew Burton
format Journal article
container_title Journal of The Electrochemical Society
container_volume 164
container_issue 4
container_start_page D192
publishDate 2017
institution Swansea University
issn 0013-4651
1945-7111
doi_str_mv 10.1149/2.1151704jes
college_str Faculty of Science and Engineering
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hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Materials Science and Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Materials Science and Engineering
document_store_str 1
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description Bismuth-telluride-based alloys are currently the best commercially available thermoelectric materials for applications at room temperatures. Up to 150 micron thick layers of bismuth antimony telluride (Bi0.5Sb1.5Te3) were directly deposited onto nickel by either potenstiostatic or potentiodynamic electrodeposition. Cyclic voltammetry was employed to identify the optimal deposition potential. The films were characterized by scanning electron microscopy, energy dispersive X-rays and X-ray diffraction. The p-type films were found to be well adherent, uniform and stoichiometric with a high power factor of 2.3 × 10−4 W m−1 K−2 at film growth rates of up to 40 μm h−1.
published_date 2017-12-31T03:58:43Z
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score 10.927863