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Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers

Steve Wilks, Vincent Teng Orcid Logo

Journal of Applied Physics, Volume: 103, Issue: 5, Pages: 053708 - 053711

Swansea University Authors: Steve Wilks, Vincent Teng Orcid Logo

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DOI (Published version): 10.1063/1.2888522

Published in: Journal of Applied Physics
ISSN: 0021-8979
Published: 2008
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Item Description: From a project that grew out of collaboration with Materials and Engineering Research Institute (MERI) at Sheffield Hallam University to understand the factors that affect the electronic properties of metal contacts to large bandgap materials. This paper successfully demonstrated the crucial interplay between the nanoscale structure of the metal-semiconductor interface and the resulting electrical properties. The author made a substantial contribution to the conception and design of the study, the organisation of the study and to the development of the theoretical model.
College: College of Science
Issue: 5
Start Page: 053708
End Page: 053711