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Ferroelectric-HfO<sub>2</sub>/oxide interfaces, oxygen distribution effects, and implications for device performance

Shihui Zhao, Bowen Li, Yuzheng Guo Orcid Logo, Huanglong Li Orcid Logo

Applied Physics Letters, Volume: 120, Issue: 1, Pages: 012904 - 012904

Swansea University Author: Yuzheng Guo Orcid Logo

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DOI (Published version): 10.1063/5.0074332

Published in: Applied Physics Letters
ISSN: 0003-6951 1077-3118
Published: AIP Publishing 2022
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College: Faculty of Science and Engineering
Funders: National Natural Science Foundation (Grant Nos. 61974082, 61704096, and61836004); National Key R&D Program of China (Grant No. 2018YFE0200200), the Youth Elite Scientist Sponsorship (YESS) Program of China Association for Science and Technology (CAST) (Grant No. 2019QNRC001); supercomputing wales (Project No. scw1070), Cambridge CSD3 supercomputing (Project No. cs129 MorieBand); Tsinghua-IDG/McGovern Brain-X program, Beijing Science and Technology Program (Grant Nos. Z181100001518006 and Z191100007519009); the Suzhou-Tsinghua Innovation Leading Program (Grant No. 2016SZ0102); the CETC Haikang GroupBrain Inspired Computing Joint Research Center
Issue: 1
Start Page: 012904
End Page: 012904