Journal article 860 views
Ferroelectric-HfO<sub>2</sub>/oxide interfaces, oxygen distribution effects, and implications for device performance
Applied Physics Letters, Volume: 120, Issue: 1, Pages: 012904 - 012904
Swansea University Author: Yuzheng Guo
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DOI (Published version): 10.1063/5.0074332
Abstract
Ferroelectric-HfO<sub>2</sub>/oxide interfaces, oxygen distribution effects, and implications for device performance
Published in: | Applied Physics Letters |
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ISSN: | 0003-6951 1077-3118 |
Published: |
AIP Publishing
2022
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Online Access: |
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URI: | https://cronfa.swan.ac.uk/Record/cronfa59182 |
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College: |
Faculty of Science and Engineering |
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Funders: |
National Natural Science Foundation (Grant Nos. 61974082, 61704096, and61836004); National Key R&D Program of China (Grant No. 2018YFE0200200), the Youth Elite Scientist Sponsorship (YESS) Program of China Association for Science and Technology (CAST) (Grant No. 2019QNRC001); supercomputing wales (Project No. scw1070), Cambridge CSD3 supercomputing (Project No. cs129
MorieBand); Tsinghua-IDG/McGovern Brain-X program, Beijing Science and Technology Program (Grant Nos. Z181100001518006 and Z191100007519009); the Suzhou-Tsinghua Innovation Leading
Program (Grant No. 2016SZ0102); the CETC Haikang GroupBrain Inspired Computing Joint Research Center |
Issue: |
1 |
Start Page: |
012904 |
End Page: |
012904 |