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High-quality germanium growth on (111)-faceted V-groove silicon by molecular beam epitaxy

Makhayeni Mtunzi Orcid Logo, Hui Jia Orcid Logo, Yaonan Hou Orcid Logo, Xueying Yu, Haotian Zeng, Junjie Yang, Xingzhao Yan, Ilias Skandalos, Huiwen Deng, Jae-Seong Park, Wei Li Orcid Logo, Ang Li, Khalil El Hajraoui, Quentin Ramasse, Frederic Gardes, Mingchu Tang, Siming Chen Orcid Logo, Alwyn Seeds, Huiyun Liu Orcid Logo

Journal of Physics D: Applied Physics, Volume: 57, Issue: 25, Start page: 255101

Swansea University Author: Yaonan Hou Orcid Logo

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Abstract

High-quality and low-defect-density germanium (Ge) buffer layers on silicon (Si) substrates have long been developed for group IV and III–V devices by suppressing defect propagation during epitaxial growth. This is a crucial step for the development of highly efficient photonic devices on Si substra...

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Published in: Journal of Physics D: Applied Physics
ISSN: 0022-3727 1361-6463
Published: IOP Publishing 2024
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa67691
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Abstract: High-quality and low-defect-density germanium (Ge) buffer layers on silicon (Si) substrates have long been developed for group IV and III–V devices by suppressing defect propagation during epitaxial growth. This is a crucial step for the development of highly efficient photonic devices on Si substrates. Patterned silicon substrates have increasingly been employed for their ability to restrict and hinder the motion of defects. In this work, we demonstrate the effectiveness of an optimised two-step growth recipe structure on a (111)-faceted V-groove silicon substrate with a 350 nm flat ridge. This strategy successfully reduces the threading dislocation (TD) density while growing a 1 μm Ge buffer layer via molecular beam epitaxy. As a result, a high-quality buffer is produced with a low TD density on the order of 107 cm−2 and a surface roughness below 1 nm.
Keywords: V-groove, aspect ratio trapping, annealing
College: Faculty of Science and Engineering
Funders: This work wassupported by the UKEngineering and Physical Sciences Research Council (EP/P006973/1, EP/R029075/1, EP/T028475/1, EP/V036327/1, EP/V048732/1, W021080/1, and EP/X015300/1, EP/S024441/1).
Issue: 25
Start Page: 255101