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The effect of rapid thermal annealing on 1.55 μm InAs/InP quantum dots
Journal of Physics D: Applied Physics, Volume: 58, Issue: 12, Start page: 125104
Swansea University Author:
Yaonan Hou
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© 2025 The Author(s). Original content from this work may be used under the terms of the Creative Commons Attribution 4.0 licence (CC-BY 4.0).
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DOI (Published version): 10.1088/1361-6463/adabf1
Abstract
Rapid thermal annealing (RTA) can be used as a post-growth method to adjust the optical properties of III–V materials. This work investigates the efficacy of applying cyclic RTA to 1.55 μm multi-layer InAs/InAlGaAs quantum dots (QDs) grown on (001) InP substrate by molecular beam epitaxy. Samples cy...
Published in: | Journal of Physics D: Applied Physics |
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ISSN: | 0022-3727 1361-6463 |
Published: |
IOP Publishing
2025
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Online Access: |
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URI: | https://cronfa.swan.ac.uk/Record/cronfa68753 |
Abstract: |
Rapid thermal annealing (RTA) can be used as a post-growth method to adjust the optical properties of III–V materials. This work investigates the efficacy of applying cyclic RTA to 1.55 μm multi-layer InAs/InAlGaAs quantum dots (QDs) grown on (001) InP substrate by molecular beam epitaxy. Samples cyclically-annealed at 600 °C retain most of their as-grown optical, structural, and compositional characteristics whilst exhibiting a 4.6-fold increase in peak PL intensity. This strategy was successfully implemented in broad-area devices with improved slope efficiency and output power, demonstrating cyclic RTA as an effective method in enhancing high-performance 1.55 μm QD lasers on InP (001) substrates. |
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Keywords: |
quantum dots, rapid thermal annealing, molecular beam epitaxy |
College: |
Faculty of Science and Engineering |
Funders: |
This work was supported in part by Engineering and Physical Sciences Research Council (Grant Nos EP/V029681/1, EP/P006973/1, EP/S024441/1, EP/W021080/1, EP/V036432/1, EP/V029606/1, EP/Z532848/1, EP/T028475/1, EP/V036327/1, EP/V048732/1, and EP/X015300/1). |
Issue: |
12 |
Start Page: |
125104 |