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Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching

Andreas Frommhold, Richard Palmer Orcid Logo, Alex P. G. Robinson

Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume: 12, Issue: 3, Start page: 033003

Swansea University Author: Richard Palmer Orcid Logo

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Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS
ISSN: 1932-5150
Published: 2013
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49275
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College: College of Engineering
Issue: 3
Start Page: 033003