Journal article 779 views
Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
Andreas Frommhold,
Richard Palmer 
,
Alex P. G. Robinson
,
Alex P. G. Robinson
Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume: 12, Issue: 3, Start page: 033003
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1117/1.JMM.12.3.033003
Abstract
Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
| Published in: | Journal of Micro/Nanolithography, MEMS, and MOEMS |
|---|---|
| ISSN: | 1932-5150 |
| Published: |
2013
|
| Online Access: |
Check full text
|
| URI: | https://cronfa.swan.ac.uk/Record/cronfa49275 |
| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
3 |
| Start Page: |
033003 |