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High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

Ying Zhang, A. Frommhold, J. Manyam, R. E. Palmer, A. P. G. Robinson, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.916426

Published: 2012
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College: Faculty of Science and Engineering