Journal article 863 views
High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask
Ying Zhang,
A. Frommhold,
J. Manyam,
R. E. Palmer,
A. P. G. Robinson,
Richard Palmer 
Swansea University Author:
Richard Palmer
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DOI (Published version): 10.1117/12.916426
Abstract
High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask
| Published: |
2012
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49286 |
| College: |
Faculty of Science and Engineering |
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