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High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

Ying Zhang, A. Frommhold, J. Manyam, R. E. Palmer, A. P. G. Robinson, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.916426

Published: 2012
URI: https://cronfa.swan.ac.uk/Record/cronfa49286
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College: College of Engineering