Journal article 517 views
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching
Ying Zhang,
A. Frommhold,
R. E. Palmer,
A. P. G. Robinson,
Gottlieb S. Oehrlein,
Qinghuang Lin,
Richard Palmer 
Swansea University Author:
Richard Palmer
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DOI (Published version): 10.1117/12.2011465
Abstract
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching
| Published: |
2013
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49276 |
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| College: |
Faculty of Science and Engineering |
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