Journal article 874 views
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching
Ying Zhang,
A. Frommhold,
R. E. Palmer,
A. P. G. Robinson,
Gottlieb S. Oehrlein,
Qinghuang Lin,
Richard Palmer 
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1117/12.2011465
Abstract
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching
| Published: |
2013
|
|---|---|
| URI: | https://cronfa.swan.ac.uk/Record/cronfa49276 |
| first_indexed |
2019-03-18T20:01:32Z |
|---|---|
| last_indexed |
2019-03-18T20:01:32Z |
| id |
cronfa49276 |
| recordtype |
SURis |
| fullrecord |
<?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:30:19.5932540</datestamp><bib-version>v2</bib-version><id>49276</id><entry>2019-03-18</entry><title>Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>ACEM</deptcode><abstract/><type>Journal Article</type><journal></journal><volume></volume><journalNumber></journalNumber><paginationStart/><paginationEnd/><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint/><issnElectronic/><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>2013</publishedYear><publishedDate>2013-12-31</publishedDate><doi>10.1117/12.2011465</doi><url/><notes/><college>COLLEGE NANME</college><department>Aerospace, Civil, Electrical, and Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>ACEM</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:30:19.5932540</lastEdited><Created>2019-03-18T14:30:19.3580925</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>Ying</firstname><surname>Zhang</surname><order>1</order></author><author><firstname>A.</firstname><surname>Frommhold</surname><order>2</order></author><author><firstname>R. E.</firstname><surname>Palmer</surname><order>3</order></author><author><firstname>A. P. G.</firstname><surname>Robinson</surname><order>4</order></author><author><firstname>Gottlieb S.</firstname><surname>Oehrlein</surname><order>5</order></author><author><firstname>Qinghuang</firstname><surname>Lin</surname><order>6</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>7</order></author></authors><documents/><OutputDurs/></rfc1807> |
| spelling |
2019-03-18T14:30:19.5932540 v2 49276 2019-03-18 Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 ACEM Journal Article 31 12 2013 2013-12-31 10.1117/12.2011465 COLLEGE NANME Aerospace, Civil, Electrical, and Mechanical Engineering COLLEGE CODE ACEM Swansea University 2019-03-18T14:30:19.5932540 2019-03-18T14:30:19.3580925 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Ying Zhang 1 A. Frommhold 2 R. E. Palmer 3 A. P. G. Robinson 4 Gottlieb S. Oehrlein 5 Qinghuang Lin 6 Richard Palmer 0000-0001-8728-8083 7 |
| title |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| spellingShingle |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching Richard Palmer |
| title_short |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| title_full |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| title_fullStr |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| title_full_unstemmed |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| title_sort |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| author_id_str_mv |
6ae369618efc7424d9774377536ea519 |
| author_id_fullname_str_mv |
6ae369618efc7424d9774377536ea519_***_Richard Palmer |
| author |
Richard Palmer |
| author2 |
Ying Zhang A. Frommhold R. E. Palmer A. P. G. Robinson Gottlieb S. Oehrlein Qinghuang Lin Richard Palmer |
| format |
Journal article |
| publishDate |
2013 |
| institution |
Swansea University |
| doi_str_mv |
10.1117/12.2011465 |
| college_str |
Faculty of Science and Engineering |
| hierarchytype |
|
| hierarchy_top_id |
facultyofscienceandengineering |
| hierarchy_top_title |
Faculty of Science and Engineering |
| hierarchy_parent_id |
facultyofscienceandengineering |
| hierarchy_parent_title |
Faculty of Science and Engineering |
| department_str |
School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering |
| document_store_str |
0 |
| active_str |
0 |
| published_date |
2013-12-31T05:49:12Z |
| _version_ |
1850736799435980800 |
| score |
11.08895 |