Journal article 614 views
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching
Ying Zhang,
A. Frommhold,
R. E. Palmer,
A. P. G. Robinson,
Gottlieb S. Oehrlein,
Qinghuang Lin,
Richard Palmer 
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1117/12.2011465
Abstract
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching
| Published: |
2013
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49276 |
| first_indexed |
2019-03-18T20:01:32Z |
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| last_indexed |
2019-03-18T20:01:32Z |
| id |
cronfa49276 |
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SURis |
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| spelling |
2019-03-18T14:30:19.5932540 v2 49276 2019-03-18 Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 ACEM Journal Article 31 12 2013 2013-12-31 10.1117/12.2011465 COLLEGE NANME Aerospace, Civil, Electrical, and Mechanical Engineering COLLEGE CODE ACEM Swansea University 2019-03-18T14:30:19.5932540 2019-03-18T14:30:19.3580925 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Ying Zhang 1 A. Frommhold 2 R. E. Palmer 3 A. P. G. Robinson 4 Gottlieb S. Oehrlein 5 Qinghuang Lin 6 Richard Palmer 0000-0001-8728-8083 7 |
| title |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| spellingShingle |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching Richard Palmer |
| title_short |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| title_full |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| title_fullStr |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| title_full_unstemmed |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| title_sort |
Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching |
| author_id_str_mv |
6ae369618efc7424d9774377536ea519 |
| author_id_fullname_str_mv |
6ae369618efc7424d9774377536ea519_***_Richard Palmer |
| author |
Richard Palmer |
| author2 |
Ying Zhang A. Frommhold R. E. Palmer A. P. G. Robinson Gottlieb S. Oehrlein Qinghuang Lin Richard Palmer |
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Journal article |
| publishDate |
2013 |
| institution |
Swansea University |
| doi_str_mv |
10.1117/12.2011465 |
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Faculty of Science and Engineering |
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facultyofscienceandengineering |
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Faculty of Science and Engineering |
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facultyofscienceandengineering |
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Faculty of Science and Engineering |
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School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering |
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0 |
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0 |
| published_date |
2013-12-31T13:48:57Z |
| _version_ |
1822138342012092416 |
| score |
11.048626 |