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Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching

Ying Zhang, A. Frommhold, R. E. Palmer, A. P. G. Robinson, Gottlieb S. Oehrlein, Qinghuang Lin, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.2011465

Published: 2013
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College: Faculty of Science and Engineering