No Cover Image

Book 631 views

Chemically amplified molecular resists for e-beam lithography

Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

Published: 2007
URI: https://cronfa.swan.ac.uk/Record/cronfa49342
Tags: Add Tag
No Tags, Be the first to tag this record!
first_indexed 2019-03-18T20:01:42Z
last_indexed 2019-03-18T20:01:42Z
id cronfa49342
recordtype SURis
fullrecord <?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:32:50.0549403</datestamp><bib-version>v2</bib-version><id>49342</id><entry>2019-03-18</entry><title>Chemically amplified molecular resists for e-beam lithography</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>MECH</deptcode><abstract/><type>Book</type><journal></journal><volume></volume><journalNumber></journalNumber><paginationStart/><paginationEnd/><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint/><issnElectronic/><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>2007</publishedYear><publishedDate>2007-12-31</publishedDate><doi/><url/><notes/><college>COLLEGE NANME</college><department>Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>MECH</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:32:50.0549403</lastEdited><Created>2019-03-18T14:32:50.0549403</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>1</order></author></authors><documents/><OutputDurs/></rfc1807>
spelling 2019-03-18T14:32:50.0549403 v2 49342 2019-03-18 Chemically amplified molecular resists for e-beam lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Book 31 12 2007 2007-12-31 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:32:50.0549403 2019-03-18T14:32:50.0549403 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Richard Palmer 0000-0001-8728-8083 1
title Chemically amplified molecular resists for e-beam lithography
spellingShingle Chemically amplified molecular resists for e-beam lithography
Richard Palmer
title_short Chemically amplified molecular resists for e-beam lithography
title_full Chemically amplified molecular resists for e-beam lithography
title_fullStr Chemically amplified molecular resists for e-beam lithography
title_full_unstemmed Chemically amplified molecular resists for e-beam lithography
title_sort Chemically amplified molecular resists for e-beam lithography
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 Richard Palmer
format Book
publishDate 2007
institution Swansea University
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2007-12-31T04:00:16Z
_version_ 1763753083734589440
score 11.017797

Similar Items