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A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures

Dongxu Yang, Xiangyi Chen, Dongsheng He Orcid Logo, Andreas Frommhold, Xiaoqing Shi, Stuart A. Boden, Maria A. Lebedeva Orcid Logo, Olga V. Ershova, Richard Palmer Orcid Logo, Ziyou Li, Haofei Shi, Jianzhi Gao, Minghu Pan Orcid Logo, Andrei N. Khlobystov Orcid Logo, Thomas W. Chamberlain Orcid Logo, Alex P. G. Robinson

The Journal of Physical Chemistry Letters, Volume: 13, Issue: 6, Pages: 1578 - 1586

Swansea University Author: Richard Palmer Orcid Logo

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Abstract

The development of patterning materials (“resists”) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottomup construction of distinct nanoarchitectures. Patterning of carbo...

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Published in: The Journal of Physical Chemistry Letters
ISSN: 1948-7185 1948-7185
Published: American Chemical Society (ACS) 2022
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URI: https://cronfa.swan.ac.uk/Record/cronfa60488
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fullrecord <?xml version="1.0"?><rfc1807><datestamp>2022-11-24T16:03:00.6829798</datestamp><bib-version>v2</bib-version><id>60488</id><entry>2022-07-13</entry><title>A Fullerene&#x2013;Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2022-07-13</date><deptcode>MECH</deptcode><abstract>The development of patterning materials (&#x201C;resists&#x201D;) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottomup construction of distinct nanoarchitectures. Patterning of carbon nanostructures, a seemingly ideal application for organic functional resists, has been highly relianton complicated pattern transfer processes because of a lack of patternable precursors. Herein, we present a fullerene&#x2212;metal coordination complex as a fabrication material for direct functional patterning of sub-10 nm metal-containing carbon structures. The attachment of one platinum atom per fullerene molecule not only leads to significant improvement of sensitivity and resolution but also enables stable atomic dispersion of the platinum ions within the carbon matrix, which may gain fundamentally new interest in functional patterning of hierarchical carbon nanostructures.</abstract><type>Journal Article</type><journal>The Journal of Physical Chemistry Letters</journal><volume>13</volume><journalNumber>6</journalNumber><paginationStart>1578</paginationStart><paginationEnd>1586</paginationEnd><publisher>American Chemical Society (ACS)</publisher><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint>1948-7185</issnPrint><issnElectronic>1948-7185</issnElectronic><keywords/><publishedDay>17</publishedDay><publishedMonth>2</publishedMonth><publishedYear>2022</publishedYear><publishedDate>2022-02-17</publishedDate><doi>10.1021/acs.jpclett.1c03877</doi><url/><notes/><college>COLLEGE NANME</college><department>Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>MECH</DepartmentCode><institution>Swansea University</institution><apcterm/><funders/><projectreference/><lastEdited>2022-11-24T16:03:00.6829798</lastEdited><Created>2022-07-13T15:55:12.0829631</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>Dongxu</firstname><surname>Yang</surname><order>1</order></author><author><firstname>Xiangyi</firstname><surname>Chen</surname><order>2</order></author><author><firstname>Dongsheng</firstname><surname>He</surname><orcid>0000-0003-4050-9250</orcid><order>3</order></author><author><firstname>Andreas</firstname><surname>Frommhold</surname><order>4</order></author><author><firstname>Xiaoqing</firstname><surname>Shi</surname><order>5</order></author><author><firstname>Stuart A.</firstname><surname>Boden</surname><order>6</order></author><author><firstname>Maria A.</firstname><surname>Lebedeva</surname><orcid>0000-0002-4812-5537</orcid><order>7</order></author><author><firstname>Olga V.</firstname><surname>Ershova</surname><order>8</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>9</order></author><author><firstname>Ziyou</firstname><surname>Li</surname><order>10</order></author><author><firstname>Haofei</firstname><surname>Shi</surname><order>11</order></author><author><firstname>Jianzhi</firstname><surname>Gao</surname><order>12</order></author><author><firstname>Minghu</firstname><surname>Pan</surname><orcid>0000-0002-1520-209x</orcid><order>13</order></author><author><firstname>Andrei N.</firstname><surname>Khlobystov</surname><orcid>0000-0001-7738-4098</orcid><order>14</order></author><author><firstname>Thomas W.</firstname><surname>Chamberlain</surname><orcid>0000-0001-8100-6452</orcid><order>15</order></author><author><firstname>Alex P. G.</firstname><surname>Robinson</surname><order>16</order></author></authors><documents/><OutputDurs/></rfc1807>
spelling 2022-11-24T16:03:00.6829798 v2 60488 2022-07-13 A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2022-07-13 MECH The development of patterning materials (“resists”) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottomup construction of distinct nanoarchitectures. Patterning of carbon nanostructures, a seemingly ideal application for organic functional resists, has been highly relianton complicated pattern transfer processes because of a lack of patternable precursors. Herein, we present a fullerene−metal coordination complex as a fabrication material for direct functional patterning of sub-10 nm metal-containing carbon structures. The attachment of one platinum atom per fullerene molecule not only leads to significant improvement of sensitivity and resolution but also enables stable atomic dispersion of the platinum ions within the carbon matrix, which may gain fundamentally new interest in functional patterning of hierarchical carbon nanostructures. Journal Article The Journal of Physical Chemistry Letters 13 6 1578 1586 American Chemical Society (ACS) 1948-7185 1948-7185 17 2 2022 2022-02-17 10.1021/acs.jpclett.1c03877 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2022-11-24T16:03:00.6829798 2022-07-13T15:55:12.0829631 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Dongxu Yang 1 Xiangyi Chen 2 Dongsheng He 0000-0003-4050-9250 3 Andreas Frommhold 4 Xiaoqing Shi 5 Stuart A. Boden 6 Maria A. Lebedeva 0000-0002-4812-5537 7 Olga V. Ershova 8 Richard Palmer 0000-0001-8728-8083 9 Ziyou Li 10 Haofei Shi 11 Jianzhi Gao 12 Minghu Pan 0000-0002-1520-209x 13 Andrei N. Khlobystov 0000-0001-7738-4098 14 Thomas W. Chamberlain 0000-0001-8100-6452 15 Alex P. G. Robinson 16
title A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures
spellingShingle A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures
Richard Palmer
title_short A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures
title_full A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures
title_fullStr A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures
title_full_unstemmed A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures
title_sort A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 Dongxu Yang
Xiangyi Chen
Dongsheng He
Andreas Frommhold
Xiaoqing Shi
Stuart A. Boden
Maria A. Lebedeva
Olga V. Ershova
Richard Palmer
Ziyou Li
Haofei Shi
Jianzhi Gao
Minghu Pan
Andrei N. Khlobystov
Thomas W. Chamberlain
Alex P. G. Robinson
format Journal article
container_title The Journal of Physical Chemistry Letters
container_volume 13
container_issue 6
container_start_page 1578
publishDate 2022
institution Swansea University
issn 1948-7185
1948-7185
doi_str_mv 10.1021/acs.jpclett.1c03877
publisher American Chemical Society (ACS)
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
description The development of patterning materials (“resists”) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottomup construction of distinct nanoarchitectures. Patterning of carbon nanostructures, a seemingly ideal application for organic functional resists, has been highly relianton complicated pattern transfer processes because of a lack of patternable precursors. Herein, we present a fullerene−metal coordination complex as a fabrication material for direct functional patterning of sub-10 nm metal-containing carbon structures. The attachment of one platinum atom per fullerene molecule not only leads to significant improvement of sensitivity and resolution but also enables stable atomic dispersion of the platinum ions within the carbon matrix, which may gain fundamentally new interest in functional patterning of hierarchical carbon nanostructures.
published_date 2022-02-17T04:18:38Z
_version_ 1763754239372296192
score 11.017797