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Complications in silane-assisted GaN nanowire growth

Nian Jiang Orcid Logo, Saptarsi Ghosh Orcid Logo, Martin Frentrup, Simon M. Fairclough, Kagiso Loeto, Gunnar Kusch Orcid Logo, Rachel A. Oliver, Hannah J. Joyce Orcid Logo

Nanoscale Advances, Volume: 5, Issue: 9, Pages: 2610 - 2620

Swansea University Author: Saptarsi Ghosh Orcid Logo

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DOI (Published version): 10.1039/d2na00939k

Published in: Nanoscale Advances
ISSN: 2516-0230
Published: Royal Society of Chemistry (RSC) 2023
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URI: https://cronfa.swan.ac.uk/Record/cronfa66872
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College: Faculty of Science and Engineering
Issue: 9
Start Page: 2610
End Page: 2620