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Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface
Science Advances, Volume: 3, Issue: 10, Start page: e1701661
Swansea University Author: Yuzheng Guo
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DOI (Published version): 10.1126/sciadv.1701661
Abstract
Integration of transition metal dichalcogenides (TMDs) into next-generation semiconductor platforms has been limited due to a lack of effective passivation techniques for defects in TMDs. The formation of an organic-inorganic van der Waals interface between a monolayer (ML) of titanyl phthalocyanine...
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ISSN: | 2375-2548 |
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American Association for the Advancement of Science (AAAS)
2017
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2021-09-24T14:57:10.4262028 v2 37808 2018-01-03 Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface 2c285ab01f88f7ecb25a3aacabee52ea 0000-0003-2656-0340 Yuzheng Guo Yuzheng Guo true false 2018-01-03 GENG Integration of transition metal dichalcogenides (TMDs) into next-generation semiconductor platforms has been limited due to a lack of effective passivation techniques for defects in TMDs. The formation of an organic-inorganic van der Waals interface between a monolayer (ML) of titanyl phthalocyanine (TiOPc) and a ML of MoS2 is investigated as a defect passivation method. A strong negative charge transfer from MoS2 to TiOPc molecules is observed in scanning tunneling microscopy. As a result of the formation of a van der Waals interface, the ION/IOFF in back-gated MoS2 transistors increases by more than two orders of magnitude, whereas the degradation in the photoluminescence signal is suppressed. Density functional theory modeling reveals a van der Waals interaction that allows sufficient charge transfer to remove defect states in MoS2. The present organic-TMD interface is a model system to control the surface/interface states in TMDs by using charge transfer to a van der Waals bonded complex. Journal Article Science Advances 3 10 e1701661 American Association for the Advancement of Science (AAAS) 2375-2548 20 10 2017 2017-10-20 10.1126/sciadv.1701661 2019 This work has led to the author being invited to speak at MRS spring meeting. COLLEGE NANME General Engineering COLLEGE CODE GENG Swansea University 2021-09-24T14:57:10.4262028 2018-01-03T10:21:01.2881386 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - General Engineering Jun Hong Park 1 Atresh Sanne 2 Yuzheng Guo 0000-0003-2656-0340 3 Matin Amani 4 Kehao Zhang 5 Hema C. P. Movva 6 Joshua A. Robinson 7 Ali Javey 8 John Robertson 9 Sanjay K. Banerjee 10 Andrew C. Kummel 11 0037808-03012018102421.pdf park2017.pdf 2018-01-03T10:24:21.4870000 Output 3284963 application/pdf Version of Record true © 2017 The Authors. All article content, except where otherwise noted, is licensed under a Creative Commons Attribution NonCommercial License 4.0 true eng http://creativecommons.org/licenses/by-nc/4.0/ |
title |
Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface |
spellingShingle |
Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface Yuzheng Guo |
title_short |
Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface |
title_full |
Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface |
title_fullStr |
Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface |
title_full_unstemmed |
Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface |
title_sort |
Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface |
author_id_str_mv |
2c285ab01f88f7ecb25a3aacabee52ea |
author_id_fullname_str_mv |
2c285ab01f88f7ecb25a3aacabee52ea_***_Yuzheng Guo |
author |
Yuzheng Guo |
author2 |
Jun Hong Park Atresh Sanne Yuzheng Guo Matin Amani Kehao Zhang Hema C. P. Movva Joshua A. Robinson Ali Javey John Robertson Sanjay K. Banerjee Andrew C. Kummel |
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Journal article |
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Science Advances |
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3 |
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10 |
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e1701661 |
publishDate |
2017 |
institution |
Swansea University |
issn |
2375-2548 |
doi_str_mv |
10.1126/sciadv.1701661 |
publisher |
American Association for the Advancement of Science (AAAS) |
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Faculty of Science and Engineering |
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School of Aerospace, Civil, Electrical, General and Mechanical Engineering - General Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - General Engineering |
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description |
Integration of transition metal dichalcogenides (TMDs) into next-generation semiconductor platforms has been limited due to a lack of effective passivation techniques for defects in TMDs. The formation of an organic-inorganic van der Waals interface between a monolayer (ML) of titanyl phthalocyanine (TiOPc) and a ML of MoS2 is investigated as a defect passivation method. A strong negative charge transfer from MoS2 to TiOPc molecules is observed in scanning tunneling microscopy. As a result of the formation of a van der Waals interface, the ION/IOFF in back-gated MoS2 transistors increases by more than two orders of magnitude, whereas the degradation in the photoluminescence signal is suppressed. Density functional theory modeling reveals a van der Waals interaction that allows sufficient charge transfer to remove defect states in MoS2. The present organic-TMD interface is a model system to control the surface/interface states in TMDs by using charge transfer to a van der Waals bonded complex. |
published_date |
2017-10-20T03:47:40Z |
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1763752290803515392 |
score |
11.036706 |